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Refractory Metals · TB-TA-CRU

High-Purity Tantalum (Ta) Crucibles, Boats & Chemical Liners

High-purity 3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400) High-Purity tantalum (ta) crucibles, boats & chemical liners (Ta, CAS 7440-25-7) engineered for ultra-high-temperature vacuum furnaces, crystal growth, semiconductor processing, and corrosive environments.

Alternate & search designations: High-purity Ta refractory metal, vacuum furnace High-Purity tantalum (ta) crucibles, boats & chemical liners, 3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400) Ta
Purity / Grade Options3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400)
Standard DimensionsSeamless Deep-Drawn & Welded Crucibles OD 10–150 mm × Wall 0.5–5.0 mm
Available ConfigurationsStandard mill stock & precision CNC / wire-EDM custom machining to drawing
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Consolidated by powder metallurgy, vacuum arc remelting (VAR), or electron-beam melting and stress-relieved for high-temperature dimensional stability, our High-Purity tantalum (ta) crucibles, boats & chemical liners (Ta, CAS 7440-25-7) products deliver reliable performance in vacuum, inert-gas, and reducing furnace atmospheres.

Combining a 3,017 °C melting point with glass-like immunity to boiling HCl, HNO3, H2SO4, and liquid lanthanide metals, tantalum crucibles excel in rare-earth metallurgy, SiC crystal growth, and corrosive chemical processing. Every shipment includes the producing mill's chemical purity Certificate of Analysis (reporting metallic and interstitial O, N, C, H trace levels in ppm) and pre-shipment dimensional verification.

Standard Shipment Documentation: Manufacturer Mill Test Certificate / Batch COA (chemical purity and interstitial O, N, C, H ppm analysis) plus dimensional inspection report.

Primary Research & Industrial Applications

  • Melting and vacuum distillation of rare-earth metals (Sc, Y, La, Nd, Gd, Dy, Lu)
  • Sublimation physical vapor transport (PVT) growth of SiC and AlN crystals (TaC-converted liners)
  • Ultra-pure acid digestion vessels, thermowells, and autoclave liners
  • High-temperature effusion cells and e-beam crucible inserts

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Composition & CAS #Ta (CAS 7440-25-7)
Purity / Alloy Grade3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400)
Density16.65 g/cm³
Melting Point3,017 °C
Available Mill & Machined FormsSeamless Deep-Drawn & Welded Crucibles OD 10–150 mm × Wall 0.5–5.0 mm

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify Ta purity or alloy grade (3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400)), form and dimensions (Seamless Deep-Drawn & Welded Crucibles OD 10–150 mm × Wall 0.5–5.0 mm), surface finish (rolled, ground, electropolished, or chemically cleaned), and quantity.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare High-Purity Tantalum (Ta) Crucibles, Boats & Chemical Liners RFQ ↗

Technical & Procurement FAQ

What atmosphere is required when operating High-Purity tantalum (ta) crucibles, boats & chemical liners (Ta) at high temperature?
Refractory metals oxidize in air above 400–500 °C; operate in high vacuum (≤10⁻⁴ Torr), high-purity argon/helium, or reducing hydrogen/forming-gas atmospheres.
Can TB-TA-CRU be custom machined to our engineering print?
Yes. Attach a STEP/DXF/PDF drawing on the RFQ page for precision CNC turning, milling, wire-EDM, laser cutting, or forming with small-batch R&D minimums.
What certification ships with High-Purity tantalum (ta) crucibles, boats & chemical liners?
All shipments include the producing mill's batch chemical Certificate of Analysis (ICP/GDMS trace impurities and interstitial gas content) and dimensional verification.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

Tantalum & Niobium Foils, Sheets, Rods & Crucibles (Ta / Nb, CAS 7440-25-7) — Refractory Metals studio photographTB-TA-NB
Refractory MetalsTa / Nb · 7440-25-7

Tantalum & Niobium Foils, Sheets, Rods & Crucibles

Ductile 99.95%–99.99% electron-beam melted tantalum and niobium foils, plates, rods, tubes, and deep-drawn crucibles combining glass-like acid immunity with 3,017 °C refractory performance.

Purity / Grade≥99.95% (3N5) & ≥99.99% (4N) Metallurgical & Capacitor/E-Beam Grades
Typical SizeFoils 0.01–0.5 mm, Plates 1–12 mm, Seamless Tubes, Rods, Deep-Drawn Crucibles
High-Purity Tantalum (Ta) Foil, Sheet, Rod, Wire & Capillary Tubing (Ta, CAS 7440-25-7) — Refractory Metals studio photographTB-TA-SH
Refractory MetalsTa · 7440-25-7

High-Purity Tantalum (Ta) Foil, Sheet, Rod, Wire & Capillary Tubing

High-purity 3N5 (99.95%) / 4N (99.99%) Annealed Ductile Grade High-Purity tantalum (ta) foil, sheet, rod, wire & capillary tubing (Ta, CAS 7440-25-7) engineered for ultra-high-temperature vacuum furnaces, crystal growth, semiconductor processing, and corrosive environments.

Purity / Grade3N5 (99.95%) / 4N (99.99%) Annealed Ductile Grade
Typical SizeFoil 0.01–0.5 mm; Sheet 0.5–6.0 mm; Wire Ø 0.05–3.0 mm; Rods Ø 2–50 mm; Seamless Tube
High-Purity Tungsten (W) Crucibles & Sapphire Growth Vessels (W, CAS 7440-33-7) — Refractory Metals studio photographTB-W-CRU
Refractory MetalsW · 7440-33-7

High-Purity Tungsten (W) Crucibles & Sapphire Growth Vessels

High-purity 3N5 (99.95%) / 4N (99.99%) CIP-Sintered, Forged, or Spun High-Purity tungsten (w) crucibles & sapphire growth vessels (W, CAS 7440-33-7) engineered for ultra-high-temperature vacuum furnaces, crystal growth, semiconductor processing, and corrosive environments.

Purity / Grade3N5 (99.95%) / 4N (99.99%) CIP-Sintered, Forged, or Spun
Typical SizeOD 10–400 mm × Wall 1.5–15 mm (Sintered-machined, forged, or seamless spun)
Tantalum (Ta) Sputtering Targets (Ta, CAS 7440-25-7) — Thin Film Materials studio photographTB-PVD-TA
Thin Film MaterialsTa · 7440-25-7

Tantalum (Ta) Sputtering Targets

Vacuum-melted high-purity tantalum (Ta, CAS 7440-25-7) planar magnetron sputtering targets in 3N5 (99.95%) / 4N (99.99%) / 4N5 grades for semiconductor, optical, and research PVD.

Purity / Grade3N5 (99.95%) / 4N (99.99%) / 4N5
Typical SizeØ 1", 2", 3", 4", 6", 8" × Thickness 2–12.7 mm; Rectangular
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

Start a quote request ↗