| TB-AL2O3-TU | Alumina Ceramic Tubes | Al2O3 | 1344-28-1 | Technical Ceramics | 99.5% / 99.7% / 99.8% Al2O3 | Quote ↗ |
| TB-AL2O3-CR | Alumina Crucibles & Lids | Al2O3 | 1344-28-1 | Technical Ceramics | 99.5% / 99.8% Al2O3 | Quote ↗ |
| TB-AL2O3-TC | Thermocouple Protection Tubes | Al2O3 | 1344-28-1 | Technical Ceramics | 99.5% / 99.7% Al2O3 (C799) | Quote ↗ |
| TB-AL2O3-BT | Alumina Combustion Boats | Al2O3 | 1344-28-1 | Technical Ceramics | 99.5% / 99.8% Al2O3 | Quote ↗ |
| TB-AL2O3-RD | Alumina Ceramic Rods | Al2O3 | 1344-28-1 | Technical Ceramics | 99.0% / 99.5% / 99.8% Al2O3 | Quote ↗ |
| TB-AL2O3-PL | Alumina Ceramic Plates | Al2O3 | 1344-28-1 | Technical Ceramics | 96% / 99.5% / 99.6% Al2O3 | Quote ↗ |
| TB-CER-INS | Ceramic Insulators | Al2O3 / ZrO2 / MgSiO3 | 1344-28-1 | Technical Ceramics | 95%–99.8% Al2O3, YSZ, Steatite, Cordierite | Quote ↗ |
| TB-HBN-MC | Hexagonal Boron Nitride (h-BN) Ceramics | BN | 10043-11-5 | Technical Ceramics | 99% Pure BN / Binderless PBN /BN-ZrO2-SiC Composites | Quote ↗ |
| TB-ZRO2-CR | Yttria-Stabilized Zirconia (YSZ) Ceramics | ZrO2 · Y2O3 | 1314-23-4 | Technical Ceramics | 3Y-TZP (94.7% ZrO2) & 8Y-FSZ Refractory Grades | Quote ↗ |
| TB-SIC-CMP | Silicon Carbide (SiC) & Silicon Nitride (Si3N4) Parts | SiC / Si3N4 | 409-21-2 | Technical Ceramics | SSiC (≥98.5% Direct-Sintered SiC) & GPSN/HIP Si3N4 | Quote ↗ |
| TB-MGC-STK | Machinable Mica Glass-Ceramic Stock & Parts | KMg3(AlSi3O10)F2 · Glass | 65997-17-3 | Technical Ceramics | Zero-Porosity Fluorphlogopite Mica Glass-Ceramic | Quote ↗ |
| TB-SIO2-TU | High-Purity Fused Quartz Furnace Tubes | SiO2 | 60676-86-0 | Fused Quartz & Substrates | ≥99.99% SiO2 (4N Semiconductor Grade, <20 ppm total metals) | Quote ↗ |
| TB-SIO2-BT | Fused Quartz Sample Boats & Wafer Carriers | SiO2 | 60676-86-0 | Fused Quartz & Substrates | ≥99.99% SiO2 Semiconductor-Grade Quartz | Quote ↗ |
| TB-SIO2-CR | Clear Fused Quartz Crucibles & Evaporating Dishes | SiO2 | 60676-86-0 | Fused Quartz & Substrates | ≥99.99% SiO2 Clear Fused Quartz | Quote ↗ |
| TB-SIO2-WN | UV Fused Silica & Optical Quartz Windows | SiO2 | 60676-86-0 | Fused Quartz & Substrates | JGS1 (Deep-UV 185–2,100 nm) / JGS2 (UV-VIS) / JGS3 (IR Low-OH) | Quote ↗ |
| TB-SAP-SB | Single-Crystal Sapphire Windows & Substrates | α-Al2O3 (Single Crystal) | 1344-28-1 | Fused Quartz & Substrates | ≥99.995% Single-Crystal Al2O3 (4N5–5N Kyropoulos/EFG) | Quote ↗ |
| TB-GR-CR | Graphite Crucibles | C | 7782-42-5 | Graphite Components | 99.9% (Ash <500 ppm) to 99.995% Purified (<20–50 ppm Ash) | Quote ↗ |
| TB-GR-CNC | Custom Graphite Components | C | 7782-42-5 | Graphite Components | Isostatic Grades (1.80–1.92 g/cm³); Purified <5–50 ppm Ash; SiC-Coated | Quote ↗ |
| TB-GR-PL | Graphite Plates & Blocks | C | 7782-42-5 | Graphite Components | Molded Fine-Grain & Isostatic High-Density (99.9%–99.99% C) | Quote ↗ |
| TB-GR-MLD | Graphite Ingot Casting & Hot-Press Sintering Molds | C | 7782-42-5 | Graphite Components | High-Strength High-Density Isostatic Graphite (1.85–1.92 g/cm³) | Quote ↗ |
| TB-GR-FLT | Rigid & Soft Graphite Vacuum Furnace Insulation Felt | C | 7782-42-5 | Graphite Components | ≥99.0%–99.9% Graphitized PAN / Rayon Carbon (<100–500 ppm Ash) | Quote ↗ |
| TB-PG-GC | Pyrolytic Graphite & Glassy (Vitreous) Carbon | C | 7440-44-0 | Graphite Components | ≥99.999% (5N CVD Pyrolytic Graphite & Polymeric Glassy Carbon) | Quote ↗ |
| TB-PVD-MT | Metal Sputtering Targets | Ti / Cr / Al / Cu / Ni / W / Mo / Ta | 7440-32-6 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 / 5N (99.999%) | Quote ↗ |
| TB-PVD-OX | Oxide & Nitride Ceramic Sputtering Targets | ITO / ZnO / Al2O3 / SiO2 / TiO2 / AlN / SiC | 50926-11-9 | Thin Film Materials | 99.9% (3N) / 99.99% (4N) / 99.995% (4N5) | Quote ↗ |
| TB-PVD-EV | Evaporation Materials | Al / Cu / Ti / Cr / Ni / Ge / SiO2 / MgF2 / TiO2 | 7429-90-5 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N (99.999%) Vacuum-Degassed | Quote ↗ |
| TB-PVD-LN | E-Beam Evaporation Crucible Pocket Liners | Cu / C (Graphite & Vitreous) / Mo / W / Al2O3 / BN | 7440-50-8 | Thin Film Materials | OFHC Cu (99.99%), Purified Graphite/Vitreous C (<20 ppm), 99.95% Mo/W | Quote ↗ |
| TB-PVD-BT | Tungsten, Molybdenum & Tantalum Evaporation Boats | W / Mo / Ta | 7440-33-7 | Thin Film Materials | ≥99.95% W, Mo, & Ta Vacuum-Grade Refractory Sheet/Wire | Quote ↗ |
| TB-PVD-QCM | QCM Thin-Film Deposition Monitor Crystals | α-SiO2 + Au / Ag-Al Alloy Electrodes | 14808-60-7 | Thin Film Materials | AT-Cut Piezoelectric Quartz (6.0 MHz & 5.0 MHz Fundamental) | Quote ↗ |
| TB-W-CMP | Pure Tungsten Crucibles, Rods, Sheets & Furnace Hardware | W | 7440-33-7 | Refractory Metals | ≥99.95% W (3N5) & ≥99.99% W (4N); W-La2O3 / W-Re Alloys | Quote ↗ |
| TB-MO-CMP | Molybdenum Sintering Boats, Plates, Rods & Heat Shields | Mo | 7439-98-7 | Refractory Metals | ≥99.95% Pure Mo (ASTM B386/B387) & TZM / Mo-La Alloys | Quote ↗ |
| TB-TA-NB | Tantalum & Niobium Foils, Sheets, Rods & Crucibles | Ta / Nb | 7440-25-7 | Refractory Metals | ≥99.95% (3N5) & ≥99.99% (4N) Metallurgical & Capacitor/E-Beam Grades | Quote ↗ |
| TB-TI-GR | High-Purity & Grade 1/2 Titanium Foils, Plates & Mesh | Ti | 7440-32-6 | Refractory Metals | Grade 1 / Grade 2 CP Ti, Grade 5 (Ti-6Al-4V), & 99.99% (4N) High-Purity Ti | Quote ↗ |
| TB-BAT-FM | Porous Nickel & Copper Metal Foam Current Collectors | Ni / Cu / Fe-Ni / Ni-Cr | 7440-02-0 | Battery & Milling Labware | ≥99.8% Ni & ≥99.9% Cu Open-Cell 3D Reticulated Metal Foams | Quote ↗ |
| TB-EC-TIF | Sintered Titanium Fiber Felt & Porous Transport Layers | Ti (Optional Pt / IrO2 Coating) | 7440-32-6 | Battery & Milling Labware | ≥99.7% Vacuum-Sintered Pure Titanium Microfibers | Quote ↗ |
| TB-MIL-ZR | Yttria-Stabilized Zirconia Grinding Media & Mill Jars | ZrO2 · Y2O3 (95% 3Y-TZP) | 1314-23-4 | Battery & Milling Labware | 94.7%–95% ZrO2 + 5.2 wt% Y2O3 (3 mol% YSZ Ultra-Low-Wear Grade) | Quote ↗ |
| TB-LAB-HYD | PTFE & PPL Hydrothermal Synthesis Autoclave Reactors | PTFE / PPL + 316L Stainless Steel | 9002-84-0 | Battery & Milling Labware | Virgin Trace-Metal-Clean PTFE (≤220 °C) & PPL Para-Polyphenylene (≤260–280 °C) | Quote ↗ |
| TB-PVD-TI | Titanium (Ti) Sputtering Targets | Ti | 7440-32-6 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) / 5N | Quote ↗ |
| TB-PVD-CR | Chromium (Cr) Sputtering Targets | Cr | 7440-47-3 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-AL | Aluminum (Al) Sputtering Targets | Al | 7429-90-5 | Thin Film Materials | 4N (99.99%) / 5N (99.999%) / 5N5 | Quote ↗ |
| TB-PVD-CU | Copper (Cu) Sputtering Targets | Cu | 7440-50-8 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) / 6N OFHC | Quote ↗ |
| TB-PVD-NI | Nickel (Ni) Sputtering Targets | Ni | 7440-02-0 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) / 5N | Quote ↗ |
| TB-PVD-W | Tungsten (W) Sputtering Targets | W | 7440-33-7 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 5N | Quote ↗ |
| TB-PVD-MO | Molybdenum (Mo) Sputtering Targets | Mo | 7439-98-7 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-TA | Tantalum (Ta) Sputtering Targets | Ta | 7440-25-7 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-NB | Niobium (Nb) Sputtering Targets | Nb | 7440-03-1 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / High-RRR 4N5 | Quote ↗ |
| TB-PVD-SI | Silicon (Si) Sputtering Targets | Si | 7440-21-3 | Thin Film Materials | 5N (99.999%) / 6N Intrinsic, B-doped (p-type), or P-doped (n-type) | Quote ↗ |
| TB-PVD-GE | Germanium (Ge) Sputtering Targets | Ge | 7440-56-4 | Thin Film Materials | 5N (99.999%) / 6N (99.9999%) Intrinsic or Ga/Sb-Doped | Quote ↗ |
| TB-PVD-V | Vanadium (V) Sputtering Targets | V | 7440-62-2 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) | Quote ↗ |
| TB-PVD-ZR | Zirconium (Zr) Sputtering Targets | Zr | 7440-67-7 | Thin Film Materials | 3N5 (99.95% Grade 702) / 4N Low-Hf (<100 ppm Hf) | Quote ↗ |
| TB-PVD-HF | Hafnium (Hf) Sputtering Targets | Hf | 7440-58-6 | Thin Film Materials | 3N5 (99.95% excl. Zr) / 4N Low-Zr | Quote ↗ |
| TB-PVD-CO | Cobalt (Co) Sputtering Targets | Co | 7440-48-4 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-FE | Iron (Fe) Sputtering Targets | Fe | 7439-89-6 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-MN | Manganese (Mn) Sputtering Targets | Mn | 7439-96-5 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99%) | Quote ↗ |
| TB-PVD-ZN | Zinc (Zn) Sputtering Targets | Zn | 7440-66-6 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) / 5N | Quote ↗ |
| TB-PVD-SN | Tin (Sn) Sputtering Targets | Sn | 7440-31-5 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N (99.999%) | Quote ↗ |
| TB-PVD-IN | Indium (In) Sputtering Targets | In | 7440-74-6 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) / 6N | Quote ↗ |
| TB-PVD-BI | Bismuth (Bi) Sputtering Targets | Bi | 7440-69-9 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N (99.999%) | Quote ↗ |
| TB-PVD-SB | Antimony (Sb) Sputtering Targets | Sb | 7440-36-0 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N (99.999%) | Quote ↗ |
| TB-PVD-TE | Tellurium (Te) Sputtering Targets | Te | 13494-80-9 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N (99.999%) | Quote ↗ |
| TB-PVD-Y | Yttrium (Y) Sputtering Targets | Y | 7440-65-5 | Thin Film Materials | 3N (99.9%) / 3N5 (99.95% REM) | Quote ↗ |
| TB-PVD-SC | Scandium (Sc) Sputtering Targets | Sc | 7440-20-2 | Thin Film Materials | 3N5 (99.95%) / 4N (99.99% REM) | Quote ↗ |
| TB-PVD-RE | Rare-Earth Metal (La, Ce, Gd, Nd, Er, Yb) (La / Ce / Gd / Nd / Er / Yb) Sputtering Targets | La / Ce / Gd / Nd / Er / Yb | 7439-91-0 | Thin Film Materials | 3N (99.9%) / 3N5 (99.95%) / 4N (REM basis) | Quote ↗ |
| TB-PVD-AG | Silver (Ag) Sputtering Targets | Ag | 7440-22-4 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) / 5N | Quote ↗ |
| TB-PVD-TIW | Titanium-Tungsten (TiW 10/90) (TiW (10:90 wt% / 30:70 at.%)) Sputtering Targets | TiW (10:90 wt% / 30:70 at.%) | 7440-33-7 | Thin Film Materials | 3N5 (99.95%) / 4N Low-Alkali Semiconductor Grade | Quote ↗ |
| TB-PVD-NICR | Nickel-Chromium (NiCr 80/20) (NiCr (80:20 / 60:40 / 50:50 wt%)) Sputtering Targets | NiCr (80:20 / 60:40 / 50:50 wt%) | 11106-97-1 | Thin Film Materials | 3N5 (99.95%) / 4N | Quote ↗ |
| TB-PVD-NIFE | Permalloy (Ni80Fe20 & CoFeB) (Ni80Fe20 / Ni81Fe19 / Co40Fe40B20) Sputtering Targets | Ni80Fe20 / Ni81Fe19 / Co40Fe40B20 | 12168-54-6 | Thin Film Materials | 3N5 (99.95%) / 4N Vacuum-Induction Melted | Quote ↗ |
| TB-PVD-ALSC | Aluminum-Scandium (AlSc Alloy) (Al1-xScx (Sc 5–43 at.%)) Sputtering Targets | Al1-xScx (Sc 5–43 at.%) | 60683-64-9 | Thin Film Materials | 4N (99.99%) Vacuum-Melted / HIP Intermetallic | Quote ↗ |
| TB-PVD-CIGS | Copper-Gallium & CIGS Alloy (CuGa (70:30 / 75:25) & CuInGaSe2) Sputtering Targets | CuGa (70:30 / 75:25) & CuInGaSe2 | 57606-41-4 | Thin Film Materials | 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-ITO | Indium Tin Oxide (In2O3:SnO2 (90:10 wt%)) Sputtering Targets | In2O3:SnO2 (90:10 wt%) | 50926-11-9 | Thin Film Materials | 4N (99.99%) · ≥99.5% Relative Density | Quote ↗ |
| TB-PVD-AZO | Aluminum-Doped Zinc Oxide (AZO) (ZnO:Al2O3 (98:2 wt%)) Sputtering Targets | ZnO:Al2O3 (98:2 wt%) | 1314-13-2 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-ZNO | Zinc Oxide (ZnO) Sputtering Targets | ZnO | 1314-13-2 | Thin Film Materials | 4N (99.99%) / 4N5 / 5N | Quote ↗ |
| TB-PVD-ALO | Aluminum Oxide (Alumina) (Al2O3) Sputtering Targets | Al2O3 | 1344-28-1 | Thin Film Materials | 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-SIO2 | Silicon Dioxide (Fused Quartz) (SiO2) Sputtering Targets | SiO2 | 60676-86-0 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) | Quote ↗ |
| TB-PVD-TIO2 | Titanium Dioxide (TiO2 / TiO2-x) Sputtering Targets | TiO2 / TiO2-x | 13463-67-7 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-TA2O5 | Tantalum Pentoxide (Ta2O5) Sputtering Targets | Ta2O5 | 1314-61-0 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) | Quote ↗ |
| TB-PVD-NB2O5 | Niobium Pentoxide (Nb2O5) Sputtering Targets | Nb2O5 | 1313-96-8 | Thin Film Materials | 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-HFO2 | Hafnium Dioxide (Hafnia) (HfO2) Sputtering Targets | HfO2 | 12055-23-1 | Thin Film Materials | 4N (99.99% excl. Zr) / Low-Zr 4N | Quote ↗ |
| TB-PVD-ZRO2 | Zirconium Dioxide & YSZ (ZrO2 / 8 mol% Y2O3-ZrO2) Sputtering Targets | ZrO2 / 8 mol% Y2O3-ZrO2 | 1314-23-4 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-WO3 | Tungsten Trioxide (WO3) Sputtering Targets | WO3 | 1314-35-8 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-MOO3 | Molybdenum Trioxide (MoO3) Sputtering Targets | MoO3 | 1313-27-5 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-NIO | Nickel Oxide (NiO (or Li-doped NiOx)) Sputtering Targets | NiO (or Li-doped NiOx) | 1313-99-1 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-SNO2 | Tin Dioxide & Antimony/Fluorine Doped (SnO2 / ATO (SnO2:Sb2O3)) Sputtering Targets | SnO2 / ATO (SnO2:Sb2O3) | 18282-10-5 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-IGZO | Indium Gallium Zinc Oxide (IGZO) (InGaZnO4 (In:Ga:Zn = 1:1:1 at.%)) Sputtering Targets | InGaZnO4 (In:Ga:Zn = 1:1:1 at.%) | Composition dependent; confirm supplier SDS | Thin Film Materials | 4N (99.99%) · High-Density Conductive Ceramic | Quote ↗ |
| TB-PVD-BST | Barium Titanate & Barium Strontium Titanate (BaTiO3 / Ba1-xSrxTiO3 (BST)) Sputtering Targets | BaTiO3 / Ba1-xSrxTiO3 (BST) | 12047-27-7 | Thin Film Materials | 3N5 (99.95%) / 4N | Quote ↗ |
| TB-PVD-PZT | Lead Zirconate Titanate (PZT 52/48) (Pb(Zr0.52Ti0.48)O3 (+10–20 mol% excess PbO)) Sputtering Targets | Pb(Zr0.52Ti0.48)O3 (+10–20 mol% excess PbO) | 12626-81-2 | Thin Film Materials | 3N5 (99.95%) | Quote ↗ |
| TB-PVD-LIB | Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) Sputtering Targets | LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO | 12190-79-3 | Thin Film Materials | 3N5 (99.95%) / 4N (with optional 10–15% Li excess) | Quote ↗ |
| TB-PVD-ALN | Aluminum Nitride (AlN) Sputtering Targets | AlN | 24304-00-5 | Thin Film Materials | 3N5 (99.95%) / 4N | Quote ↗ |
| TB-PVD-SI3N4 | Silicon Nitride (Si3N4) Sputtering Targets | Si3N4 | 12033-89-5 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-TIN | Titanium Nitride (TiN) Sputtering Targets | TiN | 25583-20-4 | Thin Film Materials | 3N5 (99.95%) / 4N | Quote ↗ |
| TB-PVD-SIC | Silicon Carbide (SiC) Sputtering Targets | SiC | 409-21-2 | Thin Film Materials | 4N (99.99%) / 4N5 | Quote ↗ |
| TB-PVD-TMD | 2D Transition-Metal Dichalcogenides (MoS2, WS2, MoSe2, WSe2) (MoS2 / WS2 / MoSe2 / WSe2) Sputtering Targets | MoS2 / WS2 / MoSe2 / WSe2 | 1317-33-5 | Thin Film Materials | 4N (99.99%) | Quote ↗ |
| TB-PVD-ZNS | Zinc Sulfide & Zinc Selenide (ZnS, ZnSe) (ZnS / ZnSe) Sputtering Targets | ZnS / ZnSe | 1314-98-3 | Thin Film Materials | 4N5 (99.995%) / 5N CVD Optical Grade | Quote ↗ |
| TB-EV-AL | Aluminum (Al) Evaporation Materials | Al | 7429-90-5 | Thin Film Materials | 5N (99.999%) / 5N5 | Quote ↗ |
| TB-EV-TI | Titanium (Ti) Evaporation Materials | Ti | 7440-32-6 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) | Quote ↗ |
| TB-EV-CR | Chromium (Cr) Evaporation Materials | Cr | 7440-47-3 | Thin Film Materials | 4N (99.99%) / 4N5 (99.995%) | Quote ↗ |
| TB-EV-CU | Copper (Cu) Evaporation Materials | Cu | 7440-50-8 | Thin Film Materials | 5N (99.999%) / 6N OFHC | Quote ↗ |
| TB-EV-NI | Nickel (Ni) Evaporation Materials | Ni | 7440-02-0 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) | Quote ↗ |
| TB-EV-AG | Silver (Ag) Evaporation Materials | Ag | 7440-22-4 | Thin Film Materials | 4N5 (99.995%) / 5N (99.999%) | Quote ↗ |
| TB-EV-GE | Germanium (Ge) Evaporation Materials | Ge | 7440-56-4 | Thin Film Materials | 5N (99.999%) / 6N Zone-Refined | Quote ↗ |
| TB-EV-SIO | Silicon Monoxide (SiO) Evaporation Materials | SiO | 10097-28-6 | Thin Film Materials | 4N (99.99%) Vacuum-Sublimed Grade | Quote ↗ |
| TB-EV-SIO2 | Silicon Dioxide (Optical Quartz) (SiO2) Evaporation Materials | SiO2 | 60676-86-0 | Thin Film Materials | 4N5 (99.995%) / 5N | Quote ↗ |
| TB-EV-MGF2 | Magnesium Fluoride (MgF2) Evaporation Materials | MgF2 | 7783-40-6 | Thin Film Materials | 4N5 (99.995%) Vacuum-Grown Crystal Optical Grade | Quote ↗ |
| TB-EV-TI3O5 | Titanium Sub-Oxide (Ti3O5 & TiO2) (Ti3O5 / TiO2) Evaporation Materials | Ti3O5 / TiO2 | 12065-65-5 | Thin Film Materials | 4N (99.99%) Pre-Reduced Spit-Free Optical Grade | Quote ↗ |
| TB-EV-TA2O5 | Tantalum Pentoxide (Ta2O5) Evaporation Materials | Ta2O5 | 1314-61-0 | Thin Film Materials | 4N (99.99%) / 4N5 Vacuum-Sintered | Quote ↗ |
| TB-EV-HFO2 | Hafnium Dioxide (HfO2) Evaporation Materials | HfO2 | 12055-23-1 | Thin Film Materials | 4N (99.99% excl. Zr) / 4N5 Low-Zr Laser Grade | Quote ↗ |
| TB-EV-ZRO2 | Zirconium Dioxide (ZrO2) Evaporation Materials | ZrO2 | 1314-23-4 | Thin Film Materials | 4N (99.99%) Optical Grade (Pure or Y2O3/TiO2-Stabilized) | Quote ↗ |
| TB-EV-AL2O3 | Aluminum Oxide (Sapphire Granules) (Al2O3) Evaporation Materials | Al2O3 | 1344-28-1 | Thin Film Materials | 4N5 (99.995%) Crushed Single-Crystal Sapphire & Sintered Tablets | Quote ↗ |
| TB-EV-INSN | Indium & Tin (In / Sn) Evaporation Materials | In / Sn | 7440-74-6 | Thin Film Materials | 5N (99.999%) / 6N | Quote ↗ |
| TB-EV-ZNS | Zinc Sulfide & Zinc Selenide (ZnS / ZnSe) Evaporation Materials | ZnS / ZnSe | 1314-98-3 | Thin Film Materials | 4N5 (99.995%) CVD Optical Grade | Quote ↗ |
| TB-EV-FL | Optical Fluorides (LiF, CaF2, BaF2, YF3, LaF3) (LiF / CaF2 / BaF2 / YF3 / LaF3) Evaporation Materials | LiF / CaF2 / BaF2 / YF3 / LaF3 | 7789-75-5 | Thin Film Materials | 4N5 (99.995%) Vacuum-Grown Optical Crystal Grade | Quote ↗ |
| TB-SUB-SI | Silicon Wafers & Thermal Oxide (SiO2/Si) Substrates | Si / SiO2-on-Si | 7440-21-3 | Fused Quartz & Substrates | Prime / Test CZ & FZ Grade (1–100 Ω·cm, Intrinsic >5,000 Ω·cm, or Degenerate 0.001–0.005 Ω·cm) | Quote ↗ |
| TB-SUB-SIC | Single-Crystal 4H-SiC & 6H-SiC Wafers & Substrates | SiC (4H / 6H) | 409-21-2 | Fused Quartz & Substrates | PVT Single-Crystal N-Type Conductive & High-Purity Semi-Insulating (HPSI) | Quote ↗ |
| TB-SUB-MGO | Magnesium Oxide (MgO) Single-Crystal Substrates | MgO | 1309-48-4 | Fused Quartz & Substrates | Arc-Fusion Single Crystal 4N (99.99%) | Quote ↗ |
| TB-SUB-STO | Strontium Titanate (SrTiO3 & Nb:STO) Single-Crystal Substrates | SrTiO3 / Nb:SrTiO3 | 12060-59-2 | Fused Quartz & Substrates | Verneuil Single Crystal 4N (Undoped Insulating or 0.05–0.7 wt% Nb-Doped Conductive) | Quote ↗ |
| TB-SUB-LAO | Lanthanum Aluminate (LaAlO3) Single-Crystal Substrates | LaAlO3 | 12003-65-5 | Fused Quartz & Substrates | Czochralski Single Crystal 4N (99.99%) | Quote ↗ |
| TB-SUB-YSZ | Yttria-Stabilized Zirconia (YSZ) Single-Crystal Substrates | ZrO2:Y2O3 (8–9.5 mol% Y2O3) | 1314-23-4 | Fused Quartz & Substrates | Skull-Melted Cubic Single Crystal 4N | Quote ↗ |
| TB-SUB-LNO | Lithium Niobate (LiNbO3) & Lithium Tantalate (LiTaO3) Wafers | LiNbO3 / LiTaO3 | 12031-63-9 | Fused Quartz & Substrates | Czochralski Optical / SAW / Black-Reduced Grade (Congruent, Stoichiometric, or 5 mol% MgO-Doped) | Quote ↗ |
| TB-SUB-GAN | GaN-on-Sapphire & AlN-on-Sapphire Epi Templates | GaN / AlN on α-Al2O3 | 25617-97-4 | Fused Quartz & Substrates | MOCVD / HVPE Epitaxial Template (Undoped, Si-Doped N-Type, or Fe-Doped Semi-Insulating) | Quote ↗ |
| TB-SUB-SPN | Magnesium Aluminate Spinel (MgAl2O4) Substrates & Windows | MgAl2O4 | 1306-44-1 | Fused Quartz & Substrates | Czochralski Single Crystal 4N (99.99%) | Quote ↗ |
| TB-SUB-QZC | Single-Crystal Quartz (AT-Cut, ST-Cut, X/Y/Z-Cut) Substrates & Windows | α-SiO2 (Single Crystal) | 14808-60-7 | Fused Quartz & Substrates | Hydrothermal Cultured Electronic & Optical Grade Single Crystal | Quote ↗ |
| TB-SUB-CAF2 | CaF2, BaF2 & MgF2 UV / Infrared Crystal Windows & Substrates | CaF2 / BaF2 / MgF2 | 7789-75-5 | Fused Quartz & Substrates | Vacuum Bridgman Single-Crystal UV / VUV / IR Excimer Grade | Quote ↗ |
| TB-SUB-GLS | Borosilicate (Borofloat 33), Alkali-Free Display & FTO/ITO Glass Substrates | SiO2-B2O3-Al2O3 / ITO-Glass / FTO-Glass | 65997-17-3 | Fused Quartz & Substrates | Schott Borofloat 33, Alkali-Free Display Glass, & Pre-Coated ITO/FTO Research Slides | Quote ↗ |
| TB-W-CRU | High-Purity Tungsten (W) Crucibles & Sapphire Growth Vessels | W | 7440-33-7 | Refractory Metals | 3N5 (99.95%) / 4N (99.99%) CIP-Sintered, Forged, or Spun | Quote ↗ |
| TB-W-ROD | Pure & Doped Tungsten (W, WL15, WL20, WC20) Rods & Electrodes | W / W-La2O3 / W-CeO2 / W-Y2O3 | 7440-33-7 | Refractory Metals | 99.95% Pure W & Non-Radioactive Lanthanated (1.5–2% La2O3) / Ceriated (2% CeO2) | Quote ↗ |
| TB-W-SH | High-Purity Tungsten (W) Foil, Sheet, Plate & Evaporation Ribbon | W | 7440-33-7 | Refractory Metals | 3N5 (99.95%) / 4N (99.99%) Warm/Cold-Rolled & Stress-Relieved | Quote ↗ |
| TB-W-WR | Pure & Potassium-Doped Non-Sag Tungsten (W / AKS) Wire & Heater Coils | W / AKS-Doped W / W3Re | 7440-33-7 | Refractory Metals | 99.95% Pure W, Potassium-Doped Non-Sag (AKS), & W-3%Re Ductile Grade | Quote ↗ |
| TB-MO-CRU | Molybdenum & Mo-La (ODS) Crucibles, Sintering Boats & Trays | Mo / Mo-La2O3 | 7439-98-7 | Refractory Metals | 99.95% Pure Mo & Lanthanated ODS Mo-La (0.3–0.7 wt% La2O3) | Quote ↗ |
| TB-MO-SH | High-Purity Molybdenum (Mo) Foil, Sheet, Plate & Discs | Mo | 7439-98-7 | Refractory Metals | 3N5 (99.95%) / 4N (99.99%) Cross-Rolled & Annealed | Quote ↗ |
| TB-MO-ROD | Molybdenum (Mo) Rods, Bars, Threaded Studs, Nuts & Washers | Mo | 7439-98-7 | Refractory Metals | 99.95% Pure Molybdenum (ASTM B387 Type 361) | Quote ↗ |
| TB-MO-TZM | TZM Molybdenum Alloy (Mo-0.5Ti-0.08Zr) Plate, Rod & Hot-Zone Tooling | Mo-0.5Ti-0.08Zr-0.02C | 7439-98-7 | Refractory Metals | ASTM B387 Type 364 (TZM Precipitation-Hardened Alloy) | Quote ↗ |
| TB-TA-CRU | High-Purity Tantalum (Ta) Crucibles, Boats & Chemical Liners | Ta | 7440-25-7 | Refractory Metals | 3N5 (99.95%) / 4N (99.99%) Electron-Beam Melted (RO5200 / RO5400) | Quote ↗ |
| TB-TA-SH | High-Purity Tantalum (Ta) Foil, Sheet, Rod, Wire & Capillary Tubing | Ta | 7440-25-7 | Refractory Metals | 3N5 (99.95%) / 4N (99.99%) Annealed Ductile Grade | Quote ↗ |
| TB-NB-SH | High-Purity & Superconducting RRR Niobium (Nb) Foil, Sheet, Rod & Tube | Nb | 7440-03-1 | Refractory Metals | 3N5 (99.95% Type 1/2) & High-RRR 30–300 Superconducting Electron-Beam Grade | Quote ↗ |
| TB-TI-ML | High-Purity Titanium (4N) & Grade 1 / 2 / 5 (Ti-6Al-4V) Foil, Sheet, Rod & Mesh | Ti / Ti-6Al-4V | 7440-32-6 | Refractory Metals | 4N (99.99%) Research Grade, CP Grade 1/2 (ASTM B265/B348), & Grade 5 (Ti-6Al-4V) | Quote ↗ |
| TB-ZR-ML | Zirconium (Zr 702 & Low-Hf 3N5) Crucibles, Foil, Sheet, Rod & Wire | Zr | 7440-67-7 | Refractory Metals | ASTM B551 Zr 702 (99.2% Zr+Hf) & Low-Hafnium 3N5 (<100 ppm Hf) Research Grade | Quote ↗ |
| TB-NI-ML | High-Purity Nickel (3N–5N & Ni 200/201) Crucibles, Foil, Sheet, Wire & Mesh | Ni | 7440-02-0 | Refractory Metals | 4N (99.99%) / 5N Research Grade & Low-Carbon Nickel 201 (UNS N02201) | Quote ↗ |
| TB-WRE-TC | Tungsten-Rhenium Thermocouple Wire (Type C, Type D & Type G) & Probes | W5Re / W26Re & W3Re / W25Re | 7440-15-5 | Refractory Metals | Matched EMF Calibration Grade (ASTM E988 / IEC 60584 Type C & Type D) | Quote ↗ |
| TB-W-CU | Tungsten-Copper (WCu) & Molybdenum-Copper (MoCu) Thermal Submounts & Electrodes | WCu (90/10, 80/20, 75/25) & MoCu (85/15, 70/30) | 7440-33-7 | Refractory Metals | Vacuum Cu-Infiltrated Composite (Zero Open Porosity, Hermetic) | Quote ↗ |
| TB-MGO-CR | Magnesia (MgO 99.4%–99.8%) Crucibles, Tubes & Setter Plates | MgO | 1309-48-4 | Technical Ceramics | 99.4% – 99.8% High-Purity Sintered Magnesia | Quote ↗ |
| TB-ZTA-CM | Zirconia-Toughened Alumina (ZTA) Structural & Wear Components | Al2O3-ZrO2 (10–20 wt% YSZ) | 1344-28-1 | Technical Ceramics | 80–90% Al2O3 + 10–20% 3Y-TZP Composite | Quote ↗ |
| TB-POR-CK | Microporous Alumina & SiC Ceramic Plates, Filters & Wafer Vacuum Chucks | Al2O3 / SiC (Controlled Open Porosity) | 1344-28-1 | Technical Ceramics | Controlled Pore Size 1 µm to 100 µm (30%–48% Open Porosity) | Quote ↗ |
| TB-TIB2-CM | Titanium Diboride (TiB2) Conductive Ceramics & Intermetallic Evaporation Boats | TiB2 / TiB2-BN-AlN | 12045-63-5 | Technical Ceramics | Hot-Pressed Monolithic TiB2 (≥98% TD) & 2-/3-Component TiB2-BN-AlN Boats | Quote ↗ |
| TB-AL2O3-MB | Multi-Bore Alumina (99.7% Al2O3) Thermocouple Insulator Beads & Rods | Al2O3 (99.7% C799) | 1344-28-1 | Technical Ceramics | 99.7% Recrystallized Alumina (DIN VDE 0335 Type C799) | Quote ↗ |
| TB-SIO2-BK | Semiconductor Fused Quartz Beakers, Wet-Bench Tanks & Vacuum Bell Jars | SiO2 (99.995%) | 60676-86-0 | Fused Quartz & Substrates | 99.995% Semiconductor & Trace-Metal Analytical Grade | Quote ↗ |
| TB-SIO2-CV | UV-VIS-NIR Fused Quartz Spectrophotometer & Fluorometer Cuvettes (190–2,500 nm) | SiO2 (JGS1 / JGS2 / JGS3) | 60676-86-0 | Fused Quartz & Substrates | JGS1 Synthetic Far-UV Quartz (190–2,500 nm) & JGS3 IR Quartz (260–3,500 nm) | Quote ↗ |
| TB-SIO2-FR | Sintered Porous Quartz Fritted Discs, Precision Quartz Rods & Micro-Capillaries | SiO2 (99.99%) | 60676-86-0 | Fused Quartz & Substrates | 99.99% Fused Quartz (Porous Grades G00/G0/G1/G2/G3/G4/G5 & Solid/Capillary) | Quote ↗ |
| TB-GR-SIC | CVD SiC-Coated & TaC-Coated Graphite Susceptors, Wafer Carriers & Heaters | C + CVD β-SiC (80–150 µm) / TaC | 409-21-2 | Graphite Components | < 5 ppm Purified Isostatic Graphite + 6N CVD β-SiC or Sintered TaC Coating | Quote ↗ |
| TB-CFC-PL | Carbon-Carbon (C/C) Composite Plates, Charging Grids, Channels & Fasteners | C/C (2D / 2.5D Carbon-Fiber Reinforced Carbon) | 7440-44-0 | Graphite Components | CVI / Pitch-Densified 2D & 2.5D Carbon-Carbon Composite (<200 ppm or <20 ppm Purified) | Quote ↗ |
| TB-GR-CRU | High-Purity Graphite Crucibles, Stopper Rods & Continuous Casting Dies | C (99.9%–99.999%) | 7440-44-0 | Graphite Components | Isostatic Fine-Grain (<20–50 ppm Ash) & Halogen-Purified (<5 ppm Ash) Grades | Quote ↗ |
| TB-GR-FL | High-Purity Flexible Graphite Foil, Hot-Press Release Sheets & Vacuum Gaskets | C (99.5% – 99.95% Exfoliated Graphite) | 7440-44-0 | Graphite Components | 99.5% Industrial, 99.85% Nuclear (<50 ppm S/Cl), & 99.95% Semiconductor Grade | Quote ↗ |
| TB-BAT-CC | Coin-Cell Hardware Kits (CR2032, CR2025, CR2016), Spacers, Wave Springs & Split Test Cells | 316L SS / 304 SS / Al-Clad / Ti | 7439-89-6 | Battery & Milling Labware | Electropolished 316L / 304 Stainless Steel & High-Voltage Al-Clad Positive Cans | Quote ↗ |
| TB-BAT-FL | Battery-Grade Copper Foil (9 µm), Aluminum Foil (15 µm) & Carbon-Coated Current Collectors | Cu (≥99.9%) / Al (≥99.6%) / C-Coated Al & Cu | 7440-50-8 | Battery & Milling Labware | Electrolytic / Rolled Battery Grade (Cu ≥99.9%, Al 1235/1060 ≥99.6%) | Quote ↗ |
| TB-EC-GDL | Carbon Fiber Paper, Carbon Cloth & MPL-Coated Gas Diffusion Layers (GDL) | C / PTFE (Graphitized PAN Carbon Fiber) | 7440-44-0 | Battery & Milling Labware | Graphitized >99.5% Carbon (Hydrophilic Untreated, PTFE-Wetproofed, or MPL-Coated) | Quote ↗ |
| TB-MIL-WC | Planetary Ball Mill Jars & Media (Tungsten Carbide, Agate, Alumina, Si3N4, PTFE & 316L SS) | WC-Co / SiO2 (Agate) / Al2O3 / Si3N4 / PTFE / Nylon | 12070-12-1 | Battery & Milling Labware | WC-6%Co, Natural Brazilian Agate (99.9% SiO2), 99.5% Al2O3, Si3N4, Virgin PTFE, & 316L SS | Quote ↗ |