Thin Film Materials · TB-PVD-ZNS
Zinc Sulfide & Zinc Selenide (ZnS, ZnSe) (ZnS / ZnSe) Sputtering Targets
High-density hot-pressed zinc sulfide & zinc selenide (ZnS, ZnSe) (ZnS / ZnSe, CAS 1314-98-3) ceramic sputtering targets in 4N5 (99.995%) / 5N CVD Optical Grade purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
Alternate & search designations: Zinc Sulfide & Zinc Selenide (ZnS, ZnSe) RF magnetron target, ZnS / ZnSe PVD dielectric cathode disc, 4N5 ZnS, ZnSe, & ZnS-SiO2 (80:20) IR optical sputtering target
Purity / Grade Options4N5 (99.995%) / 5N CVD Optical Grade
Standard DimensionsØ 1", 2", 3", 4", 6" × Thickness 2–6.35 mm (+ OFHC Cu Backing Plate)
Available ConfigurationsHot-pressed / HIP high-density ceramic disc; Metallic Indium bonded to OFHC Cu
Ordering & MOQSpecification-based quote · Prototype & production lots
Material & Engineering Overview
Sintered by vacuum hot-pressing or Hot Isostatic Pressing (HIP) from sub-micron 4N5 (99.995%) / 5N CVD Optical Grade precursor powders, our zinc sulfide & zinc selenide (ZnS, ZnSe) (ZnS / ZnSe, CAS 1314-98-3) sputtering targets achieve high relative density (typically 96%–99.5% of 4.05–5.26 g/cm³ theoretical density) and homogeneous phase stoichiometry. High density suppresses outgassing, surface nodule formation, and plasma arcing during RF magnetron or reactive pulsed-DC sputtering.
Hot-pressed and CVD-grade ZnS and ZnSe targets deposit low-absorption infrared (1–14 µm) optical interference coatings and photovoltaic buffer layers. Because ceramic targets have low thermal conductivity and limited thermal-shock resistance, we strongly recommend ordering ZnS / ZnSe targets metallic-indium bonded to an OFHC copper backing plate. Each target ships vacuum-packed with its batch chemical assay and density COA.
Standard Shipment Documentation: Manufacturer Lot COA (stoichiometry, trace metal ICP assay in ppm, sintered bulk density) and backing-plate bond inspection.
Primary Research & Industrial Applications
- Mid-wave & long-wave infrared (MWIR / LWIR 3–12 µm) thermal imaging AR coatings
- Cadmium-free Zn(O,S) buffer layers in CIGS thin-film solar cells
- Electroluminescent phosphor host thin films
- Phase-change optical disc dielectric protection stacks (ZnS-SiO2)
Nominal Material Reference Properties
| Property / Metric | Nominal Reference Value (Grade Dependent) |
| Formula & CAS # | ZnS / ZnSe (CAS 1314-98-3) |
| Purity Grades | 4N5 (99.995%) / 5N CVD Optical Grade |
| Bulk / Theoretical Density | 4.05–5.26 g/cm³ (≥96%–99.5% relative density) |
| Recommended Bonding | Metallic Indium bond to OFHC Cu backing plate (<120 °C max run temp) |
| Recommended Power Ramp | RF / Pulsed-DC ramp at 5–10 W/min with ≥2–4 L/min cooling water |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
What to Specify in Your Quote Request
Specify ZnS / ZnSe purity (4N5 (99.995%) / 5N CVD Optical Grade), exact dopant weight/mole ratio if applicable, ceramic disc diameter × thickness (e.g., Ø 50.8 × 3.175 mm), backing-plate geometry, and sputtering chamber gun model.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Zinc Sulfide & Zinc Selenide (ZnS, ZnSe) (ZnS / ZnSe) Sputtering Targets RFQ ↗
Technical & Procurement FAQ
Why should zinc sulfide & zinc selenide (ZnS, ZnSe) (ZnS / ZnSe) targets be indium-bonded to an OFHC copper backing plate?
As a brittle ceramic, ZnS / ZnSe develops steep radial thermal gradients under RF plasma heating; full-coverage metallic indium bonding transfers heat efficiently into the water-cooled copper backing plate and prevents thermal-stress cracking.
What RF power conditioning procedure avoids cracking a new ZnS / ZnSe target?
Start at low RF power (~15–25 W on a 2-inch target), ramp slowly at 5–10 W/min over 20–30 minutes while monitoring reflected power, and never exceed ~2–4 W/cm² power density on dielectric oxide/nitride targets.
Is oxygen or nitrogen reactive gas backfill needed when sputtering ZnS / ZnSe?
RF sputtering in pure argon often produces slightly anion-deficient films; introducing 1%–10% O2 (for oxides) or N2 (for nitrides) in the Ar plasma restores full stoichiometry and optical transparency.