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Thin Film Materials · TB-PVD-RE

Rare-Earth Metal (La, Ce, Gd, Nd, Er, Yb) (La / Ce / Gd / Nd / Er / Yb) Sputtering Targets

Vacuum-melted high-purity Rare-Earth metal (la, ce, gd, nd, er, yb) (La / Ce / Gd / Nd / Er / Yb, CAS 7439-91-0) planar magnetron sputtering targets in 3N (99.9%) / 3N5 (99.95%) / 4N (REM basis) grades for semiconductor, optical, and research PVD.

Alternate & search designations: High-purity Rare-Earth metal (la, ce, gd, nd, er, yb) PVD magnetron target, 3N (99.9%) / 3N5 (99.95%) / 4N (REM basis) La / Ce / Gd / Nd / Er / Yb planar sputter cathode disc, Lanthanum, cerium, gadolinium, erbium, neodymium, terbium PVD sputtering targets
Purity / Grade Options3N (99.9%) / 3N5 (99.95%) / 4N (REM basis)
Standard DimensionsØ 1", 2", 3", 4", 6", 8" × Thickness 2–12.7 mm; Rectangular
Available ConfigurationsMonolithic or OFHC Cu / Mo backing plate + Metallic Indium / Elastomer bonding
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

High-purity Rare-Earth metal (la, ce, gd, nd, er, yb) (La / Ce / Gd / Nd / Er / Yb, CAS 7439-91-0) planar sputtering targets are consolidated by vacuum melting or hot isostatic pressing and thermomechanically processed to achieve fine, equiaxed microstructure and ≥99.5%–100% relative density. Controlled grain uniformity and ultra-low dissolved gas content (O, N, H, C) ensure stable DC, pulsed-DC, RF, and HiPIMS plasma impedance with minimal droplet or particle generation across the target erosion track.

We supply the full lanthanide series (La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu) as planar sputtering targets sealed in argon/vacuum foil bags. Each Rare-Earth metal (la, ce, gd, nd, er, yb) target is precision-machined to fit 1-inch (25.4 mm), 2-inch (50.8 mm), 3-inch (76.2 mm), 4-inch (100/101.6 mm), or custom rectangular magnetron cathodes, supplied monolithic or indium-bonded to an OFHC copper backing plate, and vacuum-sealed with a batch GDMS or ICP-OES Certificate of Analysis.

Standard Shipment Documentation: Manufacturer Lot COA (GDMS or ICP-OES trace metallic impurity assay in ppm for La / Ce / Gd / Nd / Er / Yb, bulk density), dimensional inspection, and indium-bond check if bonded.

Primary Research & Industrial Applications

  • Magneto-optical and rare-earth transition-metal (TbFeCo, GdFeCo) spintronic media
  • Er- and Yb-doped waveguide amplifiers and luminescent upconversion thin films
  • High-k rare-earth oxide gate dielectrics (La2O3, CeO2, Gd2O3) and CeO2 SOFC buffer layers
  • Hard permanent-magnet NdFeB and SmCo thin-film MEMS actuators

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Chemical Formula & CAS #La / Ce / Gd / Nd / Er / Yb (CAS 7439-91-0)
Available Purity Tiers3N (99.9%) / 3N5 (99.95%) / 4N (REM basis)
Theoretical / Bulk Density6.15–9.07 g/cm³
Melting Point798–1,529 °C
Thermal / Magnetic NoteReactive lanthanide metals; Argon/oil-free sealed barrier packaging

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify Rare-Earth metal (la, ce, gd, nd, er, yb) purity grade (3N (99.9%) / 3N5 (99.95%) / 4N (REM basis)), target diameter and thickness (e.g., Ø 2.00" × 0.125" or 0.250"), flat edge vs. stepped clamp lip, magnetron gun model, and whether monolithic or indium-bonded to an OFHC copper backing plate is required.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare Rare-Earth Metal (La, Ce, Gd, Nd, Er, Yb) (La / Ce / Gd / Nd / Er / Yb) Sputtering Targets RFQ ↗

Technical & Procurement FAQ

What purity grade of Rare-Earth metal (la, ce, gd, nd, er, yb) (La / Ce / Gd / Nd / Er / Yb) sputtering target should I select?
Standard 3N (99.9%) purity suits general metallization, hard coatings, and adhesion/barrier layers, while higher 4N5–5N grades are recommended for active semiconductor junctions, low-resistivity interconnects, and quantum/optical research.
Should my Rare-Earth metal (la, ce, gd, nd, er, yb) sputtering target be bonded to a copper backing plate?
We supply the full lanthanide series (La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu) as planar sputtering targets sealed in argon/vacuum foil bags. Bonding with metallic indium to an OFHC copper backing plate is recommended for brittle compositions, thin discs, or high-power-density runs (keep cooling water at 18–22 °C so the indium bond stays below 120 °C).
What batch certification ships with TB-PVD-RE?
Every Rare-Earth metal (la, ce, gd, nd, er, yb) target ships vacuum-sealed in an argon/moisture barrier bag accompanied by the producing mill's lot Certificate of Analysis reporting elemental purity and trace metallic impurities in ppm.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

Metal Sputtering Targets (Ti / Cr / Al / Cu / Ni / W / Mo / Ta, CAS 7440-32-6) — Thin Film Materials studio photographTB-PVD-MT
Thin Film MaterialsTi / Cr / Al / Cu / Ni / W / Mo / Ta · 7440-32-6

Metal Sputtering Targets

Vacuum-melted and thermomechanically forged pure metal and custom alloy planar sputtering targets (3N5–5N) sized for research and production magnetron cathodes.

Purity / Grade3N5 (99.95%) / 4N (99.99%) / 4N5 / 5N (99.999%)
Typical SizeØ 1", 2", 3", 4", 6", 8" × Thickness 1–12.7 mm; Rectangular plates
Yttrium (Y) Sputtering Targets (Y, CAS 7440-65-5) — Thin Film Materials studio photographTB-PVD-Y
Thin Film MaterialsY · 7440-65-5

Yttrium (Y) Sputtering Targets

Vacuum-melted high-purity yttrium (Y, CAS 7440-65-5) planar magnetron sputtering targets in 3N (99.9%) / 3N5 (99.95% REM) grades for semiconductor, optical, and research PVD.

Purity / Grade3N (99.9%) / 3N5 (99.95% REM)
Typical SizeØ 1", 2", 3", 4", 6", 8" × Thickness 2–12.7 mm; Rectangular
Scandium (Sc) Sputtering Targets (Sc, CAS 7440-20-2) — Thin Film Materials studio photographTB-PVD-SC
Thin Film MaterialsSc · 7440-20-2

Scandium (Sc) Sputtering Targets

Vacuum-melted high-purity scandium (Sc, CAS 7440-20-2) planar magnetron sputtering targets in 3N5 (99.95%) / 4N (99.99% REM) grades for semiconductor, optical, and research PVD.

Purity / Grade3N5 (99.95%) / 4N (99.99% REM)
Typical SizeØ 1", 2", 3", 4", 6", 8" × Thickness 2–12.7 mm; Rectangular
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

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