Vacuum-melted high-purity niobium (Nb, CAS 7440-03-1) planar magnetron sputtering targets in 3N5 (99.95%) / 4N (99.99%) / High-RRR 4N5 grades for semiconductor, optical, and research PVD.
High-purity niobium (Nb, CAS 7440-03-1) planar sputtering targets are consolidated by vacuum melting or hot isostatic pressing and thermomechanically processed to achieve fine, equiaxed microstructure and ≥99.5%–100% relative density. Controlled grain uniformity and ultra-low dissolved gas content (O, N, H, C) ensure stable DC, pulsed-DC, RF, and HiPIMS plasma impedance with minimal droplet or particle generation across the target erosion track.
High-RRR electron-beam refined niobium targets minimize Ta, Fe, and O impurities critical for superconducting Josephson junctions and SNSPD detectors. Each niobium target is precision-machined to fit 1-inch (25.4 mm), 2-inch (50.8 mm), 3-inch (76.2 mm), 4-inch (100/101.6 mm), or custom rectangular magnetron cathodes, supplied monolithic or indium-bonded to an OFHC copper backing plate, and vacuum-sealed with a batch GDMS or ICP-OES Certificate of Analysis.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Chemical Formula & CAS # | Nb (CAS 7440-03-1) |
| Available Purity Tiers | 3N5 (99.95%) / 4N (99.99%) / High-RRR 4N5 |
| Theoretical / Bulk Density | 8.57 g/cm³ |
| Melting Point | 2,477 °C |
| Thermal / Magnetic Note | Superconducting Tc ~9.25 K (Nb) / ~16 K (NbN) |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
Specify niobium purity grade (3N5 (99.95%) / 4N (99.99%) / High-RRR 4N5), target diameter and thickness (e.g., Ø 2.00" × 0.125" or 0.250"), flat edge vs. stepped clamp lip, magnetron gun model, and whether monolithic or indium-bonded to an OFHC copper backing plate is required.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Niobium (Nb) Sputtering Targets RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-PVD-MTVacuum-melted and thermomechanically forged pure metal and custom alloy planar sputtering targets (3N5–5N) sized for research and production magnetron cathodes.
TB-NB-SHHigh-purity 3N5 (99.95% Type 1/2) & High-RRR 30–300 Superconducting Electron-Beam Grade High-Purity & superconducting RRR niobium (nb) foil, sheet, rod & tube (Nb, CAS 7440-03-1) engineered for ultra-high-temperature vacuum furnaces, crystal growth, semiconductor processing, and corrosive environments.
TB-PVD-NB2O5High-density hot-pressed niobium pentoxide (Nb2O5, CAS 1313-96-8) ceramic sputtering targets in 4N (99.99%) / 4N5 purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
TB-PVD-TAVacuum-melted high-purity tantalum (Ta, CAS 7440-25-7) planar magnetron sputtering targets in 3N5 (99.95%) / 4N (99.99%) / 4N5 grades for semiconductor, optical, and research PVD.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.