Epi-ready CMP-polished borosilicate (borofloat 33), Alkali-Free display & FTO/ITO glass substrates (SiO2-B2O3-Al2O3 / ITO-Glass / FTO-Glass, CAS 65997-17-3) wafers and diced research squares with sub-nanometer surface roughness for PVD, PLD, MBE, and ALD.
Precision-grown and chemical-mechanical-polished (CMP) in a Class 100 cleanroom, our borosilicate (borofloat 33), Alkali-Free display & FTO/ITO glass substrates (SiO2-B2O3-Al2O3 / ITO-Glass / FTO-Glass, CAS 65997-17-3) substrates provide atomically smooth, epi-ready surfaces (Ra < 0.2–0.5 nm) for thin-film epitaxy, pulsed laser deposition (PLD), magnetron sputtering, molecular beam epitaxy (MBE), and optical characterization.
Engineered for MEMS anodic bonding, microfluidics, and photovoltaic device prototyping, we supply both bare low-CTE borosilicate/alkali-free glass wafers and pre-patterned or full-sheet ITO/FTO conductive glass slides. Standard research sizes include 5×5 mm, 10×10 mm, and 15×15 mm diced squares (0.5 mm or 1.0 mm thick) as well as Ø 1-inch, 2-inch, 3-inch, and 4-inch wafers in single-side (SSP) or double-side (DSP) polished finishes, packed in individual waffle trays or nitrogen-sealed cassettes with batch orientation and surface inspection data.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Formula & CAS # | SiO2-B2O3-Al2O3 / ITO-Glass / FTO-Glass (CAS 65997-17-3) |
| Crystal System / Grade | Amorphous Optical Glass · Schott Borofloat 33, Alkali-Free Display Glass, & Pre-Coated ITO/FTO Research Slides |
| Density | 2.23 (Borofloat 33) / 2.38–2.51 g/cm³ |
| Standard Orientations | Ø 2", 3", 4", 6" Glass Wafers (0.5 / 0.7 / 1.0 mm) & Pre-Scored 25×25 mm / 15×15 mm TCO Slides |
| Surface Finish (CMP) | Optical Fire/CMP Finish + Optional 7–15 Ω/sq ITO or FTO Conductive Coating |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
Specify SiO2-B2O3-Al2O3 / ITO-Glass / FTO-Glass crystallographic orientation (Ø 2", 3", 4", 6" Glass Wafers (0.5 / 0.7 / 1.0 mm) & Pre-Scored 25×25 mm / 15×15 mm TCO Slides), dimensions and thickness (e.g., 10×10×0.5 mm or Ø 2" × 0.5 mm), SSP vs. DSP polish, edge orientation, and pack count.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Borosilicate (Borofloat 33), Alkali-Free Display & FTO/ITO Glass Substrates RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-SIO2-WNPrecision double-side optically polished UV synthetic fused silica (JGS1), optical quartz (JGS2), and full-spectrum IR fused silica (JGS3) windows and wafer substrates.
TB-PVD-ITOHigh-density hot-pressed indium tin oxide (In2O3:SnO2 (90:10 wt%), CAS 50926-11-9) ceramic sputtering targets in 4N (99.99%) · ≥99.5% Relative Density purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
TB-PVD-SNO2High-density hot-pressed tin dioxide & Antimony/Fluorine doped (SnO2 / ATO (SnO2:Sb2O3), CAS 18282-10-5) ceramic sputtering targets in 4N (99.99%) purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
TB-SUB-SIEpi-ready CMP-polished silicon wafers & thermal oxide (SiO2/Si) substrates (Si / SiO2-on-Si, CAS 7440-21-3) wafers and diced research squares with sub-nanometer surface roughness for PVD, PLD, MBE, and ALD.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.