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Fused Quartz & Substrates · TB-SIO2-BK

Semiconductor Fused Quartz Beakers, Wet-Bench Tanks & Vacuum Bell Jars

Semiconductor-grade 99.995% clear fused quartz beakers, rectangular wafer wet-bench tanks, and flanged vacuum bell jars with sub-ppm metallic leaching and extreme thermal-shock immunity.

Alternate & search designations: Semiconductor RCA acid-etch quartz tank and beaker, flanged PVD/CVD quartz vacuum bell jar
Purity / Grade Options99.995% Semiconductor & Trace-Metal Analytical Grade
Standard DimensionsBeakers 25 mL to 5,000 mL; Rectangular RCA Wet-Bench Tanks; Flanged Quartz Bell Jars
Available ConfigurationsClear fire-polished fused quartz with pouring spouts, tank flanges & O-ring collars
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Flame-worked from 4N5+ fused quartz tubing and boules, our analytical quartz labware introduces virtually zero Na, K, Fe, Cu, or B background contamination during trace-metal acid digestions, RCA wafer cleaning, and high-temperature phosphor or battery-cathode calcination.

With a thermal expansion coefficient of just 0.55 × 10⁻⁶ /K, fused quartz crucibles and dishes withstand rapid heating and air quenching up to 1,150 °C without cracking.

Standard Shipment Documentation: Manufacturer Lot COA (trace metallic impurity ICP analysis in ppm) and visual/dimensional inspection.

Primary Research & Industrial Applications

  • ICP-MS / AAS trace-element dry ashing and boiling HCl / HNO3 / H2SO4 / aqua regia digestion
  • Semiconductor wet-bench RCA cleaning tanks, boiling beakers, and HF-etch dip baths
  • High-purity phosphor, catalyst, and silica-aerogel calcination crucibles
  • Custom flanged cylindrical and domed quartz vacuum PVD/CVD bell jars

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Material Purity≥ 99.995% SiO2 (< 15–20 ppm total metallic impurities)
Continuous / Peak Temp1,100 °C Continuous / 1,250 °C Short-Term
Thermal Shock ToleranceWithstands 1,000 °C → Water Quench
Acid ResistanceInert to all acids except HF and hot H3PO4 (>300 °C)
Available FormsTall/Low-Form Crucibles, Beakers, Dishes, Flasks, & Bell Jars

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify vessel type (crucible, beaker, evaporating dish, or flanged bell jar), nominal volume (mL/L) or OD × height × wall thickness, lid style, and quantity.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare Semiconductor Fused Quartz Beakers, Wet-Bench Tanks & Vacuum Bell Jars RFQ ↗

Technical & Procurement FAQ

Can fused quartz crucibles be used with alkaline fluxes or KOH?
Avoid strong caustic alkalis (NaOH, KOH, Na2CO3) and basic oxides at high temperature, as they react with SiO2 to form silicates; use Nickel (TB-NI-ML) or Zirconium (TB-ZR-ML) crucibles for alkali fusions.
How do I prevent fingerprint devitrification on quartz labware above 1,000 °C?
Wipe outer surfaces with isopropanol or ethanol and handle with clean cotton/nitrile gloves before heating, as skin-oil sodium accelerates cristobalite devitrification above 1,050 °C.
Can you fabricate custom-port quartz reaction vessels or bell jars?
Yes. Send a sketch or CAD drawing with ground-glass joints (14/20, 24/40), KF/CF flange collars, or sidearms.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

High-Purity Fused Quartz Furnace Tubes (SiO2, CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-TU
Fused Quartz & SubstratesSiO2 · 60676-86-0

High-Purity Fused Quartz Furnace Tubes

Optically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.

Purity / Grade≥99.99% SiO2 (4N Semiconductor Grade, <20 ppm total metals)
Typical SizeOD 6–300 mm × Wall 1.5–8 mm × Length up to 2,000 mm
UV Fused Silica & Optical Quartz Windows (SiO2, CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-WN
Fused Quartz & SubstratesSiO2 · 60676-86-0

UV Fused Silica & Optical Quartz Windows

Precision double-side optically polished UV synthetic fused silica (JGS1), optical quartz (JGS2), and full-spectrum IR fused silica (JGS3) windows and wafer substrates.

Purity / GradeJGS1 (Deep-UV 185–2,100 nm) / JGS2 (UV-VIS) / JGS3 (IR Low-OH)
Typical SizeØ 5–200 mm or Square 5×5 to 150×150 mm × Thickness 0.2–20 mm
UV-VIS-NIR Fused Quartz Spectrophotometer & Fluorometer Cuvettes (190–2,500 nm) (SiO2 (JGS1 / JGS2 / JGS3), CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-CV
Fused Quartz & SubstratesSiO2 (JGS1 / JGS2 / JGS3) · 60676-86-0

UV-VIS-NIR Fused Quartz Spectrophotometer & Fluorometer Cuvettes (190–2,500 nm)

Direct thermally fused (adhesive-free) JGS1 UV-VIS-NIR quartz spectrophotometer and fluorometer cuvettes with >80% transmission from 190 nm to 2,500 nm and matched pair transmission within ≤0.5%.

Purity / GradeJGS1 Synthetic Far-UV Quartz (190–2,500 nm) & JGS3 IR Quartz (260–3,500 nm)
Typical SizePath Lengths: 1 mm, 2 mm, 5 mm, 10 mm, 20 mm, 50 mm, 100 mm (Standard 12.5×12.5×45 mm OD)
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

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