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Fused Quartz & Substrates · TB-SIO2-TU

High-Purity Fused Quartz Furnace Tubes

Optically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.

Alternate & search designations: Clear fused silica CVD process tube, GE214 equivalent quartz tube, 4N SiO2 tube-furnace liner, quartz ampoule tubing
Purity / Grade Options≥99.99% SiO2 (4N Semiconductor Grade, <20 ppm total metals)
Standard DimensionsOD 6–300 mm × Wall 1.5–8 mm × Length up to 2,000 mm
Available ConfigurationsFire-polished ends, KF/ball-joint/ground tapers, multi-zone CVD baffles
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Electrically fused high-purity quartz tubing (≥99.99% SiO2, metallic impurities typically <15–25 ppm) combines ultra-low thermal expansion (0.55 × 10⁻⁶ /K) with optical UV-to-NIR transparency and exceptional cleanliness. Unlike crystalline ceramics, fused quartz tolerates rapid sliding-zone heating and air-quench cooling cycles essential in 2D material CVD (graphene, MoS2, h-BN), rapid thermal annealing (RTA), and vacuum ampoule sealing.

Available in standard straight cut lengths with fire-polished ends as well as custom scientific glassblowing (ground Taper/Ball joints, hose barbs, closed-one-end ampoules, and stainless KF flange adapters).

Standard Shipment Documentation: Manufacturer Lot COA (trace metallic impurities in ppm, OH content) and dimensional verification.

Primary Research & Industrial Applications

  • Low-pressure & atmospheric CVD growth of graphene, CNTs, and 2D dichalcogenides
  • Semiconductor oxidation, diffusion, and rapid-quench laboratory tube furnaces
  • UV disinfection sleeves, photochemical reactors, and ICP plasma torches
  • Vacuum-sealed crystal growth ampoules

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
SiO2 Purity≥99.99% (Al <12 ppm, Fe <1 ppm, Na/K/Li <1.5 ppm each)
Continuous / Peak Temp1,100 °C continuous / 1,200–1,250 °C short-term
Thermal Expansion (CTE)0.55 × 10⁻⁶ /K (20–320 °C, extreme thermal shock resistance)
Annealing / Softening Point~1,215 °C / ~1,680 °C
Hydroxyl (OH) Content<150 ppm standard; low-OH (<5–10 ppm) vacuum grade available

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify OD × wall thickness (or ID) × overall length, end finish (diamond-cut ground vs. fire-polished, closed-one-end, or ground glass joints), low-OH requirement if operating near 1,150 °C under vacuum, and quantity.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare High-Purity Fused Quartz Furnace Tubes RFQ ↗

Technical & Procurement FAQ

Why do fused quartz tubes turn cloudy (devitrify) above 1,150 °C, and how do I prevent it?
Above ~1,150 °C, trace surface alkalis (Na/K from fingerprints or sample vapors) catalyze crystallization into cristobalite, which cracks upon cooling. Always handle quartz tubes with clean nitrile/cotton gloves, wipe with IPA before firing, and switch to 99.8% alumina tubes for work above 1,200 °C.
What OD tolerance fits standard 1-inch, 2-inch, and 50/60/80/100 mm compression O-ring tube furnaces?
Standard precision drawn quartz furnace tubes hold ±0.3 to ±1.0 mm OD tolerance depending on diameter, sealing directly against standard silicone/Viton double O-ring end flanges.
Can you supply low-OH (<5 ppm) quartz tubes for moisture-sensitive halide synthesis?
Yes—specify vacuum-melted low-OH fused quartz (<5 ppm OH) in your RFQ to eliminate high-temperature hydroxyl outgassing and sag.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

UV Fused Silica & Optical Quartz Windows (SiO2, CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-WN
Fused Quartz & SubstratesSiO2 · 60676-86-0

UV Fused Silica & Optical Quartz Windows

Precision double-side optically polished UV synthetic fused silica (JGS1), optical quartz (JGS2), and full-spectrum IR fused silica (JGS3) windows and wafer substrates.

Purity / GradeJGS1 (Deep-UV 185–2,100 nm) / JGS2 (UV-VIS) / JGS3 (IR Low-OH)
Typical SizeØ 5–200 mm or Square 5×5 to 150×150 mm × Thickness 0.2–20 mm
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

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