TB-SIO2-TUHigh-Purity Fused Quartz Furnace Tubes
Optically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.
Ultra-clean 99.99% fused quartz combustion boats, lidded CVD precursor sleds, and precision-slotted wafer carriers for contamination-free thermal processing.
Semiconductor thin-film deposition, wafer annealing, and trace-metal analytical workflows require zero metallic cross-contamination below 1,150 °C. Fabricated from 99.99% semiconductor-grade fused quartz tubing and precision-slotted rods, our quartz sample boats and multi-slot substrate carriers withstand rapid furnace insertion and withdrawal without thermal-shock cracking.
Choose smooth fire-polished powder/liquid boats with end pull-rings, baffled two-zone CVD sulfur/selenium boats, or CNC-slotted carriers sized for 10×10 mm research dies through 2", 4", 6", and 8" silicon/sapphire wafers.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Purity | ≥99.99% SiO2 (<20 ppm total metallic impurities) |
| Max Operating Temp | 1,100–1,150 °C |
| Slot Width Accuracy | ±0.10 mm CNC diamond-slotted |
| Acid Cleanability | Resistant to aqua regia, HCl, HNO3, H2SO4 (attacked only by HF / hot H3PO4) |
| Surface Finish | Flame-polished smooth non-particulating finish |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
For sample boats, specify length × width × height, handle/ring style, and furnace tube ID. For wafer carriers, specify substrate size/shape (e.g., 10×10 mm square, 2" or 4" round), wafer thickness, slot pitch, number of slots (5, 10, 25), and furnace tube ID.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Fused Quartz Sample Boats & Wafer Carriers RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-SIO2-TUOptically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.
TB-SAP-SBEpi-ready single-crystal sapphire substrates (C-, R-, A-, M-plane) and Mohs-9 optical sapphire pressure/IR windows from 180 nm UV to 5.0 µm mid-IR.
TB-AL2O3-BTHigh-purity open and lidded alumina sample boats sized to slide cleanly inside laboratory quartz and ceramic tube furnaces.
TB-SIO2-WNPrecision double-side optically polished UV synthetic fused silica (JGS1), optical quartz (JGS2), and full-spectrum IR fused silica (JGS3) windows and wafer substrates.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.