TB-PVD-EVEvaporation Materials
Vacuum-degassed 4N–5N metal evaporation slugs/shots and optical dielectric granules (SiO2, Ti3O5, MgF2, Al2O3) engineered for spit-free e-beam and thermal PVD.
Vacuum-degassed 4N (99.99% excl. Zr) / 4N5 Low-Zr Laser Grade hafnium dioxide (HfO2, CAS 12055-23-1) evaporation pellets, granules, and slugs engineered for spit-free electron-beam and resistive thermal PVD.
Prepared specifically for high-vacuum electron-beam and resistive thermal evaporation, our 4N (99.99% excl. Zr) / 4N5 Low-Zr Laser Grade hafnium dioxide (HfO2, CAS 12055-23-1) deposition materials undergo vacuum degassing or high-temperature sintering to eliminate trapped volatiles and micro-voids that cause melt spitting and pinhole film defects.
Evaporates directly by electron beam from a water-cooled copper hearth or molybdenum liner with O2 backfill; does not melt fully before subliming/evaporating smoothly. Supplied in cleanroom argon-flushed containers by weight (50 g to 1,000 g lots) or piece count, accompanied by the manufacturer's batch trace-impurity Certificate of Analysis.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Formula & CAS # | HfO2 (CAS 12055-23-1) |
| Purity Tiers | 4N (99.99% excl. Zr) / 4N5 Low-Zr Laser Grade |
| Density & Melting/Sublimation | 9.68 g/cm³ · MP/Subl. ~2,758 °C |
| Standard Forms | 1–3 mm & 1–4 mm high-density sintered granules and tablets |
| Recommended Liner / Boat | Evaporates directly by electron beam from a water-cooled copper hearth or molybdenum liner with O2 backfill |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
Specify HfO2 purity (4N (99.99% excl. Zr) / 4N5 Low-Zr Laser Grade), preferred pellet or granule size (1–3 mm & 1–4 mm high-density sintered granules and tablets), deposition method (e-beam hearth pocket cc volume vs. resistive W/Mo/Ta boat), and pack weight in grams.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Hafnium Dioxide (HfO2) Evaporation Materials RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-PVD-EVVacuum-degassed 4N–5N metal evaporation slugs/shots and optical dielectric granules (SiO2, Ti3O5, MgF2, Al2O3) engineered for spit-free e-beam and thermal PVD.
TB-PVD-HFO2High-density hot-pressed hafnium dioxide (hafnia) (HfO2, CAS 12055-23-1) ceramic sputtering targets in 4N (99.99% excl. Zr) / Low-Zr 4N purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
TB-EV-SIO2Vacuum-degassed 4N5 (99.995%) / 5N silicon dioxide (optical quartz) (SiO2, CAS 60676-86-0) evaporation pellets, granules, and slugs engineered for spit-free electron-beam and resistive thermal PVD.
TB-EV-ZRO2Vacuum-degassed 4N (99.99%) Optical Grade (Pure or Y2O3/TiO2-Stabilized) zirconium dioxide (ZrO2, CAS 1314-23-4) evaporation pellets, granules, and slugs engineered for spit-free electron-beam and resistive thermal PVD.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.