Thin Film Materials · TB-PVD-LIB
Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) Sputtering Targets
High-density hot-pressed Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO, CAS 12190-79-3) ceramic sputtering targets in 3N5 (99.95%) / 4N (with optional 10–15% Li excess) purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.
Alternate & search designations: Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) RF magnetron target, LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO PVD dielectric cathode disc, Li3PO4 (LiPON precursor), LiCoO2, & LLZO thin-film battery sputtering targets
Purity / Grade Options3N5 (99.95%) / 4N (with optional 10–15% Li excess)
Standard DimensionsØ 1", 2", 3", 4", 6" × Thickness 2–6.35 mm (+ OFHC Cu Backing Plate)
Available ConfigurationsHot-pressed / HIP high-density ceramic disc; Metallic Indium bonded to OFHC Cu
Ordering & MOQSpecification-based quote · Prototype & production lots
Material & Engineering Overview
Sintered by vacuum hot-pressing or Hot Isostatic Pressing (HIP) from sub-micron 3N5 (99.95%) / 4N (with optional 10–15% Li excess) precursor powders, our Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO, CAS 12190-79-3) sputtering targets achieve high relative density (typically 96%–99.5% of 3.0–5.0 g/cm³ theoretical density) and homogeneous phase stoichiometry. High density suppresses outgassing, surface nodule formation, and plasma arcing during RF magnetron or reactive pulsed-DC sputtering.
Hot-pressed lithium cathode (LiCoO2, NMC, LiMn2O4, LiFePO4), anode (LTO), and solid electrolyte (Li3PO4 for N2-reactive LiPON, plus Al/Ta-doped LLZO) targets—available with stoichiometric or 10–20 mol% Li2O excess. Because ceramic targets have low thermal conductivity and limited thermal-shock resistance, we strongly recommend ordering LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO targets metallic-indium bonded to an OFHC copper backing plate. Each target ships vacuum-packed with its batch chemical assay and density COA.
Standard Shipment Documentation: Manufacturer Lot COA (stoichiometry, trace metal ICP assay in ppm, sintered bulk density) and backing-plate bond inspection.
Primary Research & Industrial Applications
- Reactive N2 RF sputtering of amorphous LiPON solid-state thin-film battery electrolytes (from Li3PO4 target)
- All-solid-state micro-battery LiCoO2 and LiMn2O4 cathode thin films
- Interfacial artificial SEI barrier coatings on bulk battery electrodes
- Electrochromic Li-ion storage counter-electrodes
Nominal Material Reference Properties
| Property / Metric | Nominal Reference Value (Grade Dependent) |
| Formula & CAS # | LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO (CAS 12190-79-3) |
| Purity Grades | 3N5 (99.95%) / 4N (with optional 10–15% Li excess) |
| Bulk / Theoretical Density | 3.0–5.0 g/cm³ (≥96%–99.5% relative density) |
| Recommended Bonding | Metallic Indium bond to OFHC Cu backing plate (<120 °C max run temp) |
| Recommended Power Ramp | RF / Pulsed-DC ramp at 5–10 W/min with ≥2–4 L/min cooling water |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
Technical & Procurement FAQ
Why should Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) targets be indium-bonded to an OFHC copper backing plate?
As a brittle ceramic, LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO develops steep radial thermal gradients under RF plasma heating; full-coverage metallic indium bonding transfers heat efficiently into the water-cooled copper backing plate and prevents thermal-stress cracking.
What RF power conditioning procedure avoids cracking a new LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO target?
Start at low RF power (~15–25 W on a 2-inch target), ramp slowly at 5–10 W/min over 20–30 minutes while monitoring reflected power, and never exceed ~2–4 W/cm² power density on dielectric oxide/nitride targets.
Is oxygen or nitrogen reactive gas backfill needed when sputtering LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO?
RF sputtering in pure argon often produces slightly anion-deficient films; introducing 1%–10% O2 (for oxides) or N2 (for nitrides) in the Ar plasma restores full stoichiometry and optical transparency.