Engineered Materials & Labware • Lot COA Included154 Product Lines · CAS & Formula Index · AI / Agent Ready
Thin Film Materials · TB-PVD-LIB

Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) Sputtering Targets

High-density hot-pressed Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO, CAS 12190-79-3) ceramic sputtering targets in 3N5 (99.95%) / 4N (with optional 10–15% Li excess) purity, indium-bonded for arc-free RF and pulsed-DC thin-film deposition.

Alternate & search designations: Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) RF magnetron target, LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO PVD dielectric cathode disc, Li3PO4 (LiPON precursor), LiCoO2, & LLZO thin-film battery sputtering targets
Purity / Grade Options3N5 (99.95%) / 4N (with optional 10–15% Li excess)
Standard DimensionsØ 1", 2", 3", 4", 6" × Thickness 2–6.35 mm (+ OFHC Cu Backing Plate)
Available ConfigurationsHot-pressed / HIP high-density ceramic disc; Metallic Indium bonded to OFHC Cu
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Sintered by vacuum hot-pressing or Hot Isostatic Pressing (HIP) from sub-micron 3N5 (99.95%) / 4N (with optional 10–15% Li excess) precursor powders, our Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO, CAS 12190-79-3) sputtering targets achieve high relative density (typically 96%–99.5% of 3.0–5.0 g/cm³ theoretical density) and homogeneous phase stoichiometry. High density suppresses outgassing, surface nodule formation, and plasma arcing during RF magnetron or reactive pulsed-DC sputtering.

Hot-pressed lithium cathode (LiCoO2, NMC, LiMn2O4, LiFePO4), anode (LTO), and solid electrolyte (Li3PO4 for N2-reactive LiPON, plus Al/Ta-doped LLZO) targets—available with stoichiometric or 10–20 mol% Li2O excess. Because ceramic targets have low thermal conductivity and limited thermal-shock resistance, we strongly recommend ordering LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO targets metallic-indium bonded to an OFHC copper backing plate. Each target ships vacuum-packed with its batch chemical assay and density COA.

Standard Shipment Documentation: Manufacturer Lot COA (stoichiometry, trace metal ICP assay in ppm, sintered bulk density) and backing-plate bond inspection.

Primary Research & Industrial Applications

  • Reactive N2 RF sputtering of amorphous LiPON solid-state thin-film battery electrolytes (from Li3PO4 target)
  • All-solid-state micro-battery LiCoO2 and LiMn2O4 cathode thin films
  • Interfacial artificial SEI barrier coatings on bulk battery electrodes
  • Electrochromic Li-ion storage counter-electrodes

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Formula & CAS #LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO (CAS 12190-79-3)
Purity Grades3N5 (99.95%) / 4N (with optional 10–15% Li excess)
Bulk / Theoretical Density3.0–5.0 g/cm³ (≥96%–99.5% relative density)
Recommended BondingMetallic Indium bond to OFHC Cu backing plate (<120 °C max run temp)
Recommended Power RampRF / Pulsed-DC ramp at 5–10 W/min with ≥2–4 L/min cooling water

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO purity (3N5 (99.95%) / 4N (with optional 10–15% Li excess)), exact dopant weight/mole ratio if applicable, ceramic disc diameter × thickness (e.g., Ø 50.8 × 3.175 mm), backing-plate geometry, and sputtering chamber gun model.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare Solid-State Battery Targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) Sputtering Targets RFQ ↗

Technical & Procurement FAQ

Why should Solid-State battery targets (LiCoO2, Li3PO4, LLZO) (LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO) targets be indium-bonded to an OFHC copper backing plate?
As a brittle ceramic, LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO develops steep radial thermal gradients under RF plasma heating; full-coverage metallic indium bonding transfers heat efficiently into the water-cooled copper backing plate and prevents thermal-stress cracking.
What RF power conditioning procedure avoids cracking a new LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO target?
Start at low RF power (~15–25 W on a 2-inch target), ramp slowly at 5–10 W/min over 20–30 minutes while monitoring reflected power, and never exceed ~2–4 W/cm² power density on dielectric oxide/nitride targets.
Is oxygen or nitrogen reactive gas backfill needed when sputtering LiCoO2 / Li3PO4 / LiMn2O4 / Li4Ti5O12 / LLZO?
RF sputtering in pure argon often produces slightly anion-deficient films; introducing 1%–10% O2 (for oxides) or N2 (for nitrides) in the Ar plasma restores full stoichiometry and optical transparency.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

Oxide & Nitride Ceramic Sputtering Targets (ITO / ZnO / Al2O3 / SiO2 / TiO2 / AlN / SiC, CAS 50926-11-9) — Thin Film Materials studio photographTB-PVD-OX
Thin Film MaterialsITO / ZnO / Al2O3 / SiO2 / TiO2 / AlN / SiC · 50926-11-9

Oxide & Nitride Ceramic Sputtering Targets

High-density hot-pressed and HIP-consolidated oxide, nitride, carbide, and sulfide ceramic sputtering targets (ITO, AZO, ZnO, Al2O3, SiO2, TiO2, BaTiO3) indium-bonded for arc-free RF/pulsed-DC PVD.

Purity / Grade99.9% (3N) / 99.99% (4N) / 99.995% (4N5)
Typical SizeØ 1", 2", 3", 4", 6" × Thickness 2–6 mm (+ Cu Backing Plate)
Porous Nickel & Copper Metal Foam Current Collectors (Ni / Cu / Fe-Ni / Ni-Cr, CAS 7440-02-0) — Battery & Milling Labware studio photographTB-BAT-FM
Battery & Milling LabwareNi / Cu / Fe-Ni / Ni-Cr · 7440-02-0

Porous Nickel & Copper Metal Foam Current Collectors

High-porosity (95%–98%) 3D reticulated open-cell nickel, copper, and Fe-Ni metal foams in lab sheets, rolls, and pre-punched coin-cell discs for battery, supercapacitor, and electrocatalysis R&D.

Purity / Grade≥99.8% Ni & ≥99.9% Cu Open-Cell 3D Reticulated Metal Foams
Typical SizeThickness 0.3–10 mm; Sheets 100×100, 200×300 mm, Continuous Rolls, Punched Discs
Yttria-Stabilized Zirconia (YSZ) Single-Crystal Substrates (ZrO2:Y2O3 (8–9.5 mol% Y2O3), CAS 1314-23-4) — Fused Quartz & Substrates studio photographTB-SUB-YSZ
Fused Quartz & SubstratesZrO2:Y2O3 (8–9.5 mol% Y2O3) · 1314-23-4

Yttria-Stabilized Zirconia (YSZ) Single-Crystal Substrates

Epi-ready CMP-polished Yttria-Stabilized zirconia (YSZ) Single-Crystal substrates (ZrO2:Y2O3 (8–9.5 mol% Y2O3), CAS 1314-23-4) wafers and diced research squares with sub-nanometer surface roughness for PVD, PLD, MBE, and ALD.

Purity / GradeSkull-Melted Cubic Single Crystal 4N
Typical Size10×10 mm, 5×5 mm, 10×5 mm, Ø 1", Ø 2", Ø 3", Ø 4" × 0.5 mm / 1.0 mm
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

Start a quote request ↗