Engineered Materials & Labware • Lot COA Included154 Product Lines · CAS & Formula Index · AI / Agent Ready
Fused Quartz & Substrates · TB-SIO2-FR

Sintered Porous Quartz Fritted Discs, Precision Quartz Rods & Micro-Capillaries

Sintered porous fused quartz fritted discs (porosities G0–G5, 2–250 µm), precision centerless-ground quartz rods, and micro-capillary tubing for plug-flow catalyst reactors and gas sparging.

Alternate & search designations: Porous quartz catalyst bed frit, G0–G4 sintered silica filter disc, X-ray diffraction quartz capillary
Purity / Grade Options99.99% Fused Quartz (Porous Grades G00/G0/G1/G2/G3/G4/G5 & Solid/Capillary)
Standard DimensionsFrits Ø 4–150 mm × 1.5–6 mm; Solid Rods Ø 1–60 mm; Capillaries ID 0.1–4 mm
Available ConfigurationsStandalone porous frits, pre-fused fritted reactor tubes, & centerless-ground rods
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Sintered from graded 99.99% fused quartz grains without any foreign binder, our porous quartz fritted discs can be flame-sealed directly inside quartz reactor tubes (TB-SIO2-TU) or ordered as standalone discs to support fixed-bed catalyst powders up to 1,100 °C.

We also supply solid optical-grade fused quartz stir rods/lightguides and precision micro-capillary tubing for X-ray diffraction (XRD), GC/MS interfaces, and fiber splicing.

Standard Shipment Documentation: Manufacturer Lot COA (SiO2 purity, nominal pore rating G0–G5, dimensional check).

Primary Research & Industrial Applications

  • Fixed-bed heterogeneous catalysis plug-flow reactor supports (standalone or pre-fused in quartz tubes)
  • High-temperature corrosive gas dispersion spargers and hot particulate filtration
  • Optical light-pipe homogenizers, furnace push rods, and low-CTE structural spacers
  • Precision quartz micro-capillaries for synchrotron XRD, microfluidics, and laser delivery

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Frit Porosity GradesG0 (160–250 µm), G1 (100–160 µm), G2 (40–100 µm), G3 (16–40 µm), G4 (10–16 µm), G5 (2–5 µm)
Chemical Purity≥ 99.99% SiO2 (Binder-Free Sintered Quartz)
Max Service Temp1,050 – 1,100 °C
Frit Diameter RangeØ 4 mm to Ø 150 mm (Thickness 2–6 mm)
Rod & Capillary RangeRods Ø 1–60 mm; Capillaries ID 0.1–4.0 mm

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Specify product form (porous frit disc, frit pre-sealed inside a quartz tube, solid rod, or capillary), porosity grade (G0–G5), diameter × thickness/length, and quantity.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare Sintered Porous Quartz Fritted Discs, Precision Quartz Rods & Micro-Capillaries RFQ ↗

Technical & Procurement FAQ

Which porosity grade (G0–G4) should I pick for a fixed-bed catalyst reactor?
Choose G2 (40–100 µm) or G3 (16–40 µm) to retain fine catalyst powders while maintaining low gas pressure drop across the bed.
Can you flame-weld a quartz frit inside the middle of a quartz furnace tube?
Yes! Specify the tube OD × ID × length and the exact distance from the end where the porous quartz frit should be fused.
Do porous quartz frits contain any binder that could contaminate our catalyst?
No. They are sintered from 100% pure fused silica particles with zero binders or fluxes.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

High-Purity Fused Quartz Furnace Tubes (SiO2, CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-TU
Fused Quartz & SubstratesSiO2 · 60676-86-0

High-Purity Fused Quartz Furnace Tubes

Optically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.

Purity / Grade≥99.99% SiO2 (4N Semiconductor Grade, <20 ppm total metals)
Typical SizeOD 6–300 mm × Wall 1.5–8 mm × Length up to 2,000 mm
Semiconductor Fused Quartz Beakers, Wet-Bench Tanks & Vacuum Bell Jars (SiO2 (99.995%), CAS 60676-86-0) — Fused Quartz & Substrates studio photographTB-SIO2-BK
Fused Quartz & SubstratesSiO2 (99.995%) · 60676-86-0

Semiconductor Fused Quartz Beakers, Wet-Bench Tanks & Vacuum Bell Jars

Semiconductor-grade 99.995% clear fused quartz beakers, rectangular wafer wet-bench tanks, and flanged vacuum bell jars with sub-ppm metallic leaching and extreme thermal-shock immunity.

Purity / Grade99.995% Semiconductor & Trace-Metal Analytical Grade
Typical SizeBeakers 25 mL to 5,000 mL; Rectangular RCA Wet-Bench Tanks; Flanged Quartz Bell Jars
Microporous Alumina & SiC Ceramic Plates, Filters & Wafer Vacuum Chucks (Al2O3 / SiC (Controlled Open Porosity), CAS 1344-28-1) — Technical Ceramics studio photographTB-POR-CK
Technical CeramicsAl2O3 / SiC (Controlled Open Porosity) · 1344-28-1

Microporous Alumina & SiC Ceramic Plates, Filters & Wafer Vacuum Chucks

Precision-planarity microporous alumina and silicon carbide ceramic plates (1–100 µm pore size) for semiconductor wafer vacuum chucks, air bearings, and high-temperature filtration.

Purity / GradeControlled Pore Size 1 µm to 100 µm (30%–48% Open Porosity)
Typical SizeDiscs Ø 25–350 mm, Rectangular Plates, & Bonded Dense-Border Vacuum Chucks
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

Start a quote request ↗