TB-SIO2-TUHigh-Purity Fused Quartz Furnace Tubes
Optically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.
Sintered porous fused quartz fritted discs (porosities G0–G5, 2–250 µm), precision centerless-ground quartz rods, and micro-capillary tubing for plug-flow catalyst reactors and gas sparging.
Sintered from graded 99.99% fused quartz grains without any foreign binder, our porous quartz fritted discs can be flame-sealed directly inside quartz reactor tubes (TB-SIO2-TU) or ordered as standalone discs to support fixed-bed catalyst powders up to 1,100 °C.
We also supply solid optical-grade fused quartz stir rods/lightguides and precision micro-capillary tubing for X-ray diffraction (XRD), GC/MS interfaces, and fiber splicing.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Frit Porosity Grades | G0 (160–250 µm), G1 (100–160 µm), G2 (40–100 µm), G3 (16–40 µm), G4 (10–16 µm), G5 (2–5 µm) |
| Chemical Purity | ≥ 99.99% SiO2 (Binder-Free Sintered Quartz) |
| Max Service Temp | 1,050 – 1,100 °C |
| Frit Diameter Range | Ø 4 mm to Ø 150 mm (Thickness 2–6 mm) |
| Rod & Capillary Range | Rods Ø 1–60 mm; Capillaries ID 0.1–4.0 mm |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
Specify product form (porous frit disc, frit pre-sealed inside a quartz tube, solid rod, or capillary), porosity grade (G0–G5), diameter × thickness/length, and quantity.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Sintered Porous Quartz Fritted Discs, Precision Quartz Rods & Micro-Capillaries RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-SIO2-TUOptically clear 99.99% (4N) fused quartz process tubes for CVD graphene/2D growth, semiconductor diffusion, photochemistry, and rapid-quench tube furnaces up to 1,150 °C.
TB-SIO2-BKSemiconductor-grade 99.995% clear fused quartz beakers, rectangular wafer wet-bench tanks, and flanged vacuum bell jars with sub-ppm metallic leaching and extreme thermal-shock immunity.
TB-POR-CKPrecision-planarity microporous alumina and silicon carbide ceramic plates (1–100 µm pore size) for semiconductor wafer vacuum chucks, air bearings, and high-temperature filtration.
TB-SIO2-BTUltra-clean 99.99% fused quartz combustion boats, lidded CVD precursor sleds, and precision-slotted wafer carriers for contamination-free thermal processing.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.