Epi-ready single-crystal sapphire substrates (C-, R-, A-, M-plane) and Mohs-9 optical sapphire pressure/IR windows from 180 nm UV to 5.0 µm mid-IR.
Single-crystal alpha-Al2O3 (synthetic sapphire, Mohs hardness 9—second only to diamond and SiC/cBN) combines extreme mechanical strength and chemical inertness with broad optical transmission spanning UV (180 nm) through visible to mid-infrared (5.0 µm). In thin-film epitaxy and PVD research, epi-polished C-plane (0001), R-plane (1-102), and A-plane (11-20) substrates serve as the foundational lattice template for GaN, AlN, ZnO, superconducting YBCO, and 2D transition-metal dichalcogenide growth.
Available in pre-diced cleanroom research packs (5×5, 10×10, 10×15 mm), SEMI-standard 2"/4" wafers (single- or double-side epi-polished), and thick optical sight windows.
| Property / Metric | Nominal Reference Value (Grade Dependent) |
|---|---|
| Purity & Structure | ≥99.995% monocrystalline trigonal α-Al2O3 |
| Transmission Band | 180 nm – 5,000 nm (>83–85% uncoated across VIS-MWIR) |
| Mohs / Knoop Hardness | Mohs 9 (~2,000 kg/mm² Knoop) |
| Epi Surface Roughness | Ra < 0.2–0.3 nm (CMP epi-ready finish) |
| Melting Point | 2,040–2,053 °C (usable optically past 1,500 °C) |
Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.
For substrates, specify crystal orientation (C-, R-, A-, M-, or random optical), chip/wafer size, thickness (e.g., 0.43, 0.50, or 1.0 mm), SSP vs. DSP epi-polish, and SEMI flat. For optical windows, specify diameter × thickness, C-axis zero-birefringence orientation if polarization-sensitive, and scratch-dig.
Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.
Prepare Single-Crystal Sapphire Windows & Substrates RFQ ↗Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.
TB-SIO2-WNPrecision double-side optically polished UV synthetic fused silica (JGS1), optical quartz (JGS2), and full-spectrum IR fused silica (JGS3) windows and wafer substrates.
TB-AL2O3-PLThin tape-cast electronic substrates (96% / 99.6%) and thick precision-ground alumina setter and wear plates with optional laser cutting or CNC machining.
TB-PVD-OXHigh-density hot-pressed and HIP-consolidated oxide, nitride, carbide, and sulfide ceramic sputtering targets (ITO, AZO, ZnO, Al2O3, SiO2, TiO2, BaTiO3) indium-bonded for arc-free RF/pulsed-DC PVD.
TB-PVD-MTVacuum-melted and thermomechanically forged pure metal and custom alloy planar sputtering targets (3N5–5N) sized for research and production magnetron cathodes.
Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.