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Graphite Components · TB-GR-SIC

CVD SiC-Coated & TaC-Coated Graphite Susceptors, Wafer Carriers & Heaters

CTE-matched purified isostatic graphite susceptors encapsulated in dense 6N CVD β-SiC or tantalum carbide (TaC) coatings for GaN MOCVD, SiC CVD epitaxy, and 2,200 °C PVT crystal growth.

Alternate & search designations: MOCVD / SiC / GaN epitaxial wafer carrier susceptor, TaC-coated SiC PVT crucible & guide ring
Purity / Grade Options< 5 ppm Purified Isostatic Graphite + 6N CVD β-SiC or Sintered TaC Coating
Standard Dimensions2", 4", 6", 8" Wafer Pocket Susceptors, Multi-Wafer Planetary Discs, & Custom Heaters
Available ConfigurationsCTE-matched isostatic graphite core + dense pinhole-free CVD β-SiC or TaC encapsulation
Ordering & MOQSpecification-based quote · Prototype & production lots

Material & Engineering Overview

Bare graphite outgasses carbon dust and reacts with hydrogen (H2), ammonia (NH3), silane (SiH4), and chlorosilanes inside epitaxial reactors. By machining CTE-matched ultra-pure (<5 ppm ash) isostatic graphite and encapsulating it in a dense, pinhole-free 80–150 µm layer of 6N CVD cubic β-SiC (or 2,200 °C-rated TaC), our susceptors combine graphite's RF induction coupling and thermal shock resistance with hermetic semiconductor cleanliness.

We fabricate single-wafer and multi-wafer pocket susceptors, showerheads, liner rings, and laser-cut serpentine heaters to customer drawings.

Standard Shipment Documentation: Manufacturer Lot COA (graphite ash <5 ppm, coating thickness XRF/cross-section, pinhole check, and CMM pocket inspection).

Primary Research & Industrial Applications

  • MOCVD epitaxial growth of GaN, AlGaN, InGaN, and AlN LED/HEMT wafers (NH3 + H2 resistant)
  • CVD homoepitaxial growth of 4H-SiC power device layers at 1,550–1,650 °C (SiC- or TaC-coated)
  • Physical Vapor Transport (PVT) SiC and AlN crystal growth seed holders and guide rings (TaC-coated to 2,200 °C)
  • Silicon epitaxial barrel/pancake susceptors and RTP lamp-heated wafer trays

Nominal Material Reference Properties

Property / MetricNominal Reference Value (Grade Dependent)
Core MaterialPurified Isostatic Graphite (< 5 ppm ash, CTE 4.5–4.8 × 10⁻⁶ /K)
Coating OptionsCVD β-SiC (80–150 µm, 99.9999%) or Sintered/CVD TaC (30–80 µm)
Coating Density3.21 g/cm³ (β-SiC, zero open porosity) / 14.3 g/cm³ (TaC)
Max Operating Temp1,650 °C (CVD SiC in H2/NH3) / 2,200 °C (TaC in Ar/N2)
Pocket Flatness≤ 0.01 – 0.02 mm CNC-machined before coating

Reference values reflect typical sintered, fused, or wrought grades. Exact batch test figures are confirmed on your written quotation and accompanying lot Certificate of Analysis.

What to Specify in Your Quote Request

Attach a 2D/3D engineering drawing or specify wafer pocket size (2", 4", 6", 8"), outer susceptor diameter, CVD SiC vs. TaC coating, and operating gas/temperature.

Include target quantity, destination country/postal code for express air freight calculation, and any special cleanroom bagging or certification requests.

Prepare CVD SiC-Coated & TaC-Coated Graphite Susceptors, Wafer Carriers & Heaters RFQ ↗

Technical & Procurement FAQ

When should I choose TaC coating over CVD SiC coating on graphite?
CVD SiC is ideal up to 1,650 °C in MOCVD and Si/SiC epitaxy; above 1,700–1,800 °C (such as SiC or AlN PVT crystal growth up to 2,200 °C), choose Tantalum Carbide (TaC) coating.
Why must the graphite core be CTE-matched to the SiC coating?
Matching the isotropic graphite CTE (~4.5–4.8 ppm/K) to β-SiC (~4.5 ppm/K) prevents coating delamination or micro-cracking during rapid thermal cycling.
Can you machine custom gas channels and thermocouple bores before coating?
Yes. All pockets, lift-pin holes, and thermocouple wells are precision CNC-machined and halogen-purified prior to CVD coating so every exposed surface is sealed.
Cross-referenced catalog

Related technical materials.

Complementary furnaceware, substrates, PVD consumables, and refractory hardware frequently ordered together.

Custom Graphite Components (C, CAS 7782-42-5) — Graphite Components studio photographTB-GR-CNC
Graphite ComponentsC · 7782-42-5

Custom Graphite Components

Precision CNC-machined isostatic graphite vacuum-furnace heaters, susceptors, brazing fixtures, wafer carriers, and graphite nuts/bolts made to customer CAD drawings.

Purity / GradeIsostatic Grades (1.80–1.92 g/cm³); Purified <5–50 ppm Ash; SiC-Coated
Typical Size5-axis CNC machined from Ø 5 mm pins up to 800 mm furnace rings
Pyrolytic Graphite & Glassy (Vitreous) Carbon (C, CAS 7440-44-0) — Graphite Components studio photographTB-PG-GC
Graphite ComponentsC · 7440-44-0

Pyrolytic Graphite & Glassy (Vitreous) Carbon

Ultra-pure 5N CVD pyrolytic graphite (anisotropic thermal/diamagnetic plates) and mirror-polished gas-impermeable glassy (vitreous) carbon electrodes, wafers, and crucibles.

Purity / Grade≥99.999% (5N CVD Pyrolytic Graphite & Polymeric Glassy Carbon)
Typical SizePG plates 0.5–12 mm; Glassy carbon rods, plates, wafers, & crucibles
Single-Crystal 4H-SiC & 6H-SiC Wafers & Substrates (SiC (4H / 6H), CAS 409-21-2) — Fused Quartz & Substrates studio photographTB-SUB-SIC
Fused Quartz & SubstratesSiC (4H / 6H) · 409-21-2

Single-Crystal 4H-SiC & 6H-SiC Wafers & Substrates

Epi-ready CMP-polished Single-Crystal 4H-SiC & 6H-SiC wafers & substrates (SiC (4H / 6H), CAS 409-21-2) wafers and diced research squares with sub-nanometer surface roughness for PVD, PLD, MBE, and ALD.

Purity / GradePVT Single-Crystal N-Type Conductive & High-Purity Semi-Insulating (HPSI)
Typical Size10×10 mm, 5×5 mm, 10×5 mm, Ø 1", Ø 2", Ø 3", Ø 4" × 0.5 mm / 1.0 mm
GaN-on-Sapphire & AlN-on-Sapphire Epi Templates (GaN / AlN on α-Al2O3, CAS 25617-97-4) — Fused Quartz & Substrates studio photographTB-SUB-GAN
Fused Quartz & SubstratesGaN / AlN on α-Al2O3 · 25617-97-4

GaN-on-Sapphire & AlN-on-Sapphire Epi Templates

Epi-ready CMP-polished GaN-on-Sapphire & AlN-on-Sapphire epi templates (GaN / AlN on α-Al2O3, CAS 25617-97-4) wafers and diced research squares with sub-nanometer surface roughness for PVD, PLD, MBE, and ALD.

Purity / GradeMOCVD / HVPE Epitaxial Template (Undoped, Si-Doped N-Type, or Fe-Doped Semi-Insulating)
Typical Size10×10 mm, 5×5 mm, 10×5 mm, Ø 1", Ø 2", Ø 3", Ø 4" × 0.5 mm / 1.0 mm
Custom & catalog specifications

Need pricing, lead time, or custom dimensions?

Submit your purity grade, geometry, quantity, and documentation requirements. Every order includes the producing mill's batch Certificate of Analysis (COA) and pre-shipment dimensional verification.

Start a quote request ↗